Ting Xie

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for the treatment of workpieces
- Patent number 11,791,181
- Issue date Oct 17, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch process using hydrofluoric acid and ozone gases
- Patent number 11,791,166
- Issue date Oct 17, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface pretreatment process to improve quality of oxide films prod...
- Patent number 11,495,437
- Issue date Nov 8, 2022
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ozone for selective hydrophilic surface treatment
- Patent number 11,495,456
- Issue date Nov 8, 2022
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etch process using hydrofluoric acid and ozone gases
- Patent number 11,183,397
- Issue date Nov 23, 2021
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing of workpieces using hydrogen radicals and ozone gas
- Patent number 11,164,727
- Issue date Nov 2, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ozone treatment for selective silicon nitride etch over silicon
- Patent number 11,043,393
- Issue date Jun 22, 2021
- Mattson Technology, Inc.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration of materials removal and surface treatment in semicondu...
- Patent number 10,964,528
- Issue date Mar 30, 2021
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a workpiece
- Patent number 10,950,428
- Issue date Mar 16, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration of materials removal and surface treatment in semicondu...
- Patent number 10,403,492
- Issue date Sep 3, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Workpiece Processing Apparatus and Methods for the Treatment of Wor...
- Publication number 20240404797
- Publication date Dec 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PROCESSING WORKPIECES USING ORGANIC RADICALS
- Publication number 20240165659
- Publication date May 23, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Selective Etch Process Using Hydrofluoric Acid and Ozone Gases
- Publication number 20220084839
- Publication date Mar 17, 2022
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Apparatus For Pulsed Inductively Coupled Plasma For Sur...
- Publication number 20210343506
- Publication date Nov 4, 2021
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Etch Process Using Hydrofluoric Acid and Ozone Gases
- Publication number 20210118694
- Publication date Apr 22, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR THE TREATMENT OF WORKPIECES
- Publication number 20210082724
- Publication date Mar 18, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Processing a Workpiece
- Publication number 20210066074
- Publication date Mar 4, 2021
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING OF WORKPIECES USING HYDROGEN RADICALS AND OZONE GAS
- Publication number 20210020413
- Publication date Jan 21, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Pretreatment Process To Improve Quality Of Oxide Films Prod...
- Publication number 20200373129
- Publication date Nov 26, 2020
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ozone Treatment for Selective Silicon Nitride Etch Over Silicon
- Publication number 20200234969
- Publication date Jul 23, 2020
- Mattson Technology, Inc.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integration Of Materials Removal And Surface Treatment In Semicondu...
- Publication number 20200185216
- Publication date Jun 11, 2020
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ozone for Selective Hydrophilic Surface Treatment
- Publication number 20200118813
- Publication date Apr 16, 2020
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Methods for the treatment of workpieces

Selective etch process using hydrofluoric acid and ozone gases

Surface pretreatment process to improve quality of oxide films prod...

Ozone for selective hydrophilic surface treatment

Selective etch process using hydrofluoric acid and ozone gases

Processing of workpieces using hydrogen radicals and ozone gas

Ozone treatment for selective silicon nitride etch over silicon

Integration of materials removal and surface treatment in semicondu...

Method for processing a workpiece

Integration of materials removal and surface treatment in semicondu...

Patents Applicationslast 30 patents

Workpiece Processing Apparatus and Methods for the Treatment of Wor...

METHODS OF PROCESSING WORKPIECES USING ORGANIC RADICALS

Selective Etch Process Using Hydrofluoric Acid and Ozone Gases

Methods And Apparatus For Pulsed Inductively Coupled Plasma For Sur...

Selective Etch Process Using Hydrofluoric Acid and Ozone Gases

METHODS FOR THE TREATMENT OF WORKPIECES

Method for Processing a Workpiece

PROCESSING OF WORKPIECES USING HYDROGEN RADICALS AND OZONE GAS

Surface Pretreatment Process To Improve Quality Of Oxide Films Prod...

Ozone Treatment for Selective Silicon Nitride Etch Over Silicon

Integration Of Materials Removal And Surface Treatment In Semicondu...

Ozone for Selective Hydrophilic Surface Treatment