Tinghao F. Wang

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method for etching and/or patterning a silicon-containing layer
- Patent number 6,890,860
- Issue date May 10, 2005
- Cypress Semiconductor Corporation
- Tinghao F. Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Gas Supply With Angled Injectors In Plasma Processing Apparatus
- Publication number 20200258718
- Publication date Aug 13, 2020
- Mattson Technology, Inc.
- Tinghao F. Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Carbon Containing Hardmask Removal Process Using Sulfur Containing...
- Publication number 20200194277
- Publication date Jun 18, 2020
- Mattson Technology, Inc.
- Fen Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for selectively etching silicon and/or metal silicides
- Publication number 20020142596
- Publication date Oct 3, 2002
- Cypress Semiconductor Corporation
- Tinghao F. Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY ETCHING SILICON AND/OR METAL SILICIDES
- Publication number 20020132478
- Publication date Sep 19, 2002
- TINGHAO FRANK WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for selectively etching silicon and/or metal silicides
- Publication number 20020090817
- Publication date Jul 11, 2002
- Cypress Semiconductor Corporation
- Tinghao F. Wang
- H01 - BASIC ELECTRIC ELEMENTS