Tobias HACKL

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Neusaess, DE

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Patents Grantslast 30 patents

Information Patent Grant
Optical system for EUV lithography with a charged-particle source
- Patent number 8,546,776
- Issue date Oct 1, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING
- Publication number 20160209750
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Oliver DIER
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR EUV LITHOGRAPHY WITH A CHARGED-PARTICLE SOURCE
- Publication number 20130099132
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING