Tobias Mono

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Poughkeepsie, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for determining photoresist pattern linearity
- Patent number 6,579,650
- Issue date Jun 17, 2003
- Infineon Technologies AG
- Tobias Mono
- G01 - MEASURING TESTING
Information Patent Grant
Self-aligned STI process using nitride hard mask
- Patent number 6,551,874
- Issue date Apr 22, 2003
- Infineon Technologies, AG
- John Pohl
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for determining photoresist pattern linearity
- Publication number 20020117620
- Publication date Aug 29, 2002
- Tobias Mono
- G01 - MEASURING TESTING