Todd Bridgewater

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Kawkawlin, MI, US

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Patents Grantslast 30 patents

Information Patent Grant
Plasma curing process for porous silica thin film
- Patent number 6,558,755
- Issue date May 6, 2003
- Dow Corning Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for changing the dielectric properties of a ceramic matrix c...
- Patent number 6,294,125
- Issue date Sep 25, 2001
- Dow Corning Corporation
- Todd Jeffery Bridgewater
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES

Patents Applicationslast 30 patents

Information Patent Application
Plasma curing process for porous silica thin film
- Publication number 20030175535
- Publication date Sep 18, 2003
- Ivan L. Berry
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Plasma curing process for porous silica thin film
- Publication number 20010038919
- Publication date Nov 8, 2001
- Ivan L. Berry
- C01 - INORGANIC CHEMISTRY