Todd David Hiar

Person

Gilbert, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and device manufacturing method with radiati...
- Patent number 8,937,705
- Issue date Jan 20, 2015
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduced pitch multiple exposure process
- Patent number 7,981,595
- Issue date Jul 19, 2011
- ASML Netherlands B.V.
- Theodore A. Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduced pitch multiple exposure process
- Patent number 7,906,270
- Issue date Mar 15, 2011
- ASML Netherlands B.V.
- Theodore A Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduced pitch multiple exposure process
- Patent number 7,781,149
- Issue date Aug 24, 2010
- ASML Netherlands B.V.
- Theodore Allen Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic attribute enhancement
- Patent number 7,738,075
- Issue date Jun 15, 2010
- ASML Netherlands B.V.
- Todd D. Hiar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated lithographic fabrication cluster
- Patent number 7,274,429
- Issue date Sep 25, 2007
- ASML Netherlands B.V.
- Theodore A. Paxton
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Wafer processing apparatus and method of use
- Patent number 7,019,268
- Issue date Mar 28, 2006
- ASML Netherlands B.V.
- Theodore A. Paxton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adaptive lithographic critical dimension enhancement
- Patent number 6,873,938
- Issue date Mar 29, 2005
- ASML Netherlands B.V.
- Theodore A. Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REDUCED PITCH MULTIPLE EXPOSURE PROCESS
- Publication number 20110244401
- Publication date Oct 6, 2011
- ASML NETHERLANDS B.V.
- Theodore A. PAXTON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method with Radiati...
- Publication number 20090219500
- Publication date Sep 3, 2009
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method that compens...
- Publication number 20070046917
- Publication date Mar 1, 2007
- ASML NETHERLANDS B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reduced pitch multiple exposure process
- Publication number 20070003878
- Publication date Jan 4, 2007
- ASML NETHERLANDS B.V.
- Theodore A. Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic attribute enhancement
- Publication number 20060262287
- Publication date Nov 23, 2006
- ASML NETHERLANDS B.V.
- Todd D. Hiar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reduced pitch multiple exposure process
- Publication number 20060216653
- Publication date Sep 28, 2006
- ASML NETHERLANDS B.V.
- Theodore Allen Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reduced pitch multiple exposure process
- Publication number 20060216649
- Publication date Sep 28, 2006
- ASML NETHERLANDS B.V.
- Theodore A. Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer processing apparatus and method of use
- Publication number 20050184043
- Publication date Aug 25, 2005
- ASML NETHERLANDS B.V.
- Theodore A. Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated lithographic fabrication cluster
- Publication number 20050128464
- Publication date Jun 16, 2005
- ASML NETHERLANDS B.V.
- Theodore A. Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADAPTIVE LITHOGRAPHIC CRITICAL DIMENSION ENHANCEMENT
- Publication number 20050075819
- Publication date Apr 7, 2005
- ASML NETHERLANDS B.V.
- Theodore A. Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Todd David Hiar

Person

Patents Grantslast 30 patents

Lithographic apparatus and device manufacturing method with radiati...

Reduced pitch multiple exposure process

Reduced pitch multiple exposure process

Reduced pitch multiple exposure process

Lithographic attribute enhancement

Integrated lithographic fabrication cluster

Wafer processing apparatus and method of use

Adaptive lithographic critical dimension enhancement

Patents Applicationslast 30 patents

REDUCED PITCH MULTIPLE EXPOSURE PROCESS

Lithographic Apparatus and Device Manufacturing Method with Radiati...

Lithographic apparatus and device manufacturing method that compens...

Reduced pitch multiple exposure process

Lithographic attribute enhancement

Reduced pitch multiple exposure process

Reduced pitch multiple exposure process

Wafer processing apparatus and method of use

Integrated lithographic fabrication cluster

ADAPTIVE LITHOGRAPHIC CRITICAL DIMENSION ENHANCEMENT