Todd EGAN

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
In-line monitoring of OLED layer thickness and dopant concentration
- Patent number 12,225,808
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Yeishin Tung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spatial pattern loading measurement with imaging metrology
- Patent number 12,211,717
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Eric Chin Hong Ng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Surface roughness and emissivity determination
- Patent number 12,098,914
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Eric Chin Hong Ng
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology models for in-line film thickness measurements
- Patent number 12,062,583
- Issue date Aug 13, 2024
- Applied Materials Israel Ltd.
- Eric Chin Hong Ng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Real-time detection of particulate matter during deposition chamber...
- Patent number 12,002,665
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metrology for OLED manufacturing using photoluminescence spectroscopy
- Patent number 11,927,535
- Issue date Mar 12, 2024
- Applied Materials, Inc.
- Avishek Ghosh
- G01 - MEASURING TESTING
Information Patent Grant
Image-based in-situ process monitoring
- Patent number 11,908,716
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Guoheng Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate process endpoint detection using machine learning
- Patent number 11,901,203
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Pengyu Han
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
PECVD process
- Patent number 11,898,249
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-line monitoring of OLED layer thickness and dopant concentration
- Patent number 11,856,833
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Yeishin Tung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Autonomous substrate processing system
- Patent number 11,709,477
- Issue date Jul 25, 2023
- Applied Materials, Inc.
- Priyadarshi Panda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology for OLED manufacturing using photoluminescence spectroscopy
- Patent number 11,662,317
- Issue date May 30, 2023
- Applied Materials, Inc.
- Avishek Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD process
- Patent number 11,613,812
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems to measure properties of products on a moving b...
- Patent number 11,609,183
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Todd J. Egan
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for detection of particle size in a fluid
- Patent number 11,441,992
- Issue date Sep 13, 2022
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- G01 - MEASURING TESTING
Information Patent Grant
Spectrum shaping devices and techniques for optical characterizatio...
- Patent number 11,226,234
- Issue date Jan 18, 2022
- Applied Materials, Inc.
- Guoheng Zhao
- G01 - MEASURING TESTING
Information Patent Grant
In-situ full wafer metrology system
- Patent number 11,204,312
- Issue date Dec 21, 2021
- Applied Materials, Inc.
- Ami Sade
- G01 - MEASURING TESTING
Information Patent Grant
Imaging reflectometer
- Patent number 11,187,654
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Guoheng Zhao
- G01 - MEASURING TESTING
Information Patent Grant
Particle detection for substrate processing
- Patent number 11,119,051
- Issue date Sep 14, 2021
- Applied Materials, Inc.
- Todd Egan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology for OLED manufacturing using photoluminescence spectroscopy
- Patent number 10,935,492
- Issue date Mar 2, 2021
- Applied Materials, Inc.
- Avishek Ghosh
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system for substrate deformation measurement
- Patent number 10,923,371
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical stack deposition and on-board metrology
- Patent number 10,886,155
- Issue date Jan 5, 2021
- Applied Materials, Inc.
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle detection for substrate processing
- Patent number 10,845,317
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Todd Egan
- G01 - MEASURING TESTING
Information Patent Grant
Imaging reflectometer
- Patent number 10,816,464
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Guoheng Zhao
- G01 - MEASURING TESTING
Information Patent Grant
PECVD process
- Patent number 10,793,954
- Issue date Oct 6, 2020
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus, systems, and methods for temperature control of substrat...
- Patent number 10,736,182
- Issue date Aug 4, 2020
- Applied Materials, Inc.
- Matthew Busche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature control for additive manufacturing
- Patent number 10,710,307
- Issue date Jul 14, 2020
- Applied Materials, Inc.
- David Masayuki Ishikawa
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Equipment cleaning apparatus and method
- Patent number 10,695,804
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Roman M. Mostovoy
- B08 - CLEANING
Information Patent Grant
In-situ metrology method for thickness measurement during PECVD pro...
- Patent number 10,527,407
- Issue date Jan 7, 2020
- Applied Materials, Inc.
- Khokan C. Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Monitoring system for deposition and method of operation thereof
- Patent number 10,522,375
- Issue date Dec 31, 2019
- Applied Materials, Inc.
- Edward W. Budiarto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MULTI-TARGET DESIGN FOR IN-SITU ANALYSIS OF SEMICONDUCTOR FABRICATI...
- Publication number 20240404851
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Yudong Hao
- G05 - CONTROLLING REGULATING
Information Patent Application
REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...
- Publication number 20240304430
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU REFLECTOMETRY FOR REAL-TIME PROCESS CONTROL
- Publication number 20240142223
- Publication date May 2, 2024
- Applied Materials, Inc.
- Khokan C. PAUL
- G01 - MEASURING TESTING
Information Patent Application
IN-LINE MONITORING OF OLED LAYER THICKNESS AND DOPANT CONCENTRATION
- Publication number 20240130210
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Yeishin Tung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE ROUGHNESS AND EMISSIVITY DETERMINATION
- Publication number 20240110782
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Eric Chin Hong Ng
- G01 - MEASURING TESTING
Information Patent Application
IN-CHAMBER METROLOGY OF SUBSTRATES FOR PROCESS CHARACTERIZATION AND...
- Publication number 20240071792
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Tapashree Roy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...
- Publication number 20240027916
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- RUIYING HAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AUTONOMOUS SUBSTRATE PROCESSING SYSTEM
- Publication number 20230305531
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Priyadarshi Panda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY FOR OLED MANUFACTURING USING PHOTOLUMINESCENCE SPECTROSCOPY
- Publication number 20230266247
- Publication date Aug 24, 2023
- Applied Materials, Inc.
- Avishek GHOSH
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND SYSTEMS TO MEASURE PROPERTIES OF MOVING PRODUCTS IN DEV...
- Publication number 20230213444
- Publication date Jul 6, 2023
- Applied Materials, Inc.
- Todd J. Egan
- G01 - MEASURING TESTING
Information Patent Application
PECVD PROCESS
- Publication number 20230193466
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Nagarajan RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MONITORING OF DEPOSITED OR ETCHED FILM THICKNESS USING IMAGE-BASED...
- Publication number 20230169643
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR DETECTION OF PARTICLE SIZE IN A FLUID
- Publication number 20230060205
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Mehdi VAEZ-IRAVANI
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD TO MAP THICKNESS VARIATIONS OF SUBSTRATES INMANUF...
- Publication number 20230011748
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESS ENDPOINT DETECTION USING MACHINE LEARNING
- Publication number 20220399215
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Pengyu Han
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OBTAINING SUBSTRATE METROLOGY MEASUREMENT VALUES USING MACHINE LEAR...
- Publication number 20220397515
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Pengyu Han
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMAGE-BASED IN-SITU PROCESS MONITORING
- Publication number 20220367217
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Guoheng Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPATIAL PATTERN LOADING MEASUREMENT WITH IMAGING METROLOGY
- Publication number 20220310425
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Eric Chin Hong Ng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL METROLOGY MODELS FOR IN-LINE FILM THICKNESS MEASUREMENTS
- Publication number 20220290974
- Publication date Sep 15, 2022
- APPLIED MATERIALS ISRAEL LTD.
- Eric Chin Hong Ng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
AUTONOMOUS SUBSTRATE PROCESSING SYSTEM
- Publication number 20220214662
- Publication date Jul 7, 2022
- Applied Materials, Inc.
- Priyadarshi Panda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS TO MEASURE PROPERTIES OF PRODUCTS ON A MOVING B...
- Publication number 20220057323
- Publication date Feb 24, 2022
- Applied Materials, Inc.
- Todd J. Egan
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR DETECTION OF PARTICLE SIZE IN A FLUID
- Publication number 20210372911
- Publication date Dec 2, 2021
- Applied Materials, Inc.
- Mehdi VAEZ-IRAVANI
- G01 - MEASURING TESTING
Information Patent Application
IN-SITU FULL WAFER METROLOGY SYSTEM
- Publication number 20210285865
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Ami Sade
- G01 - MEASURING TESTING
Information Patent Application
IN-LINE MONITORING OF OLED LAYER THICKNESS AND DOPANT CONCENTRATION
- Publication number 20210226182
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- Yeishin Tung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPECTRUM SHAPING DEVICES AND TECHNIQUES FOR OPTICAL CHARACTERIZATIO...
- Publication number 20210223102
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- Guoheng Zhao
- G02 - OPTICS
Information Patent Application
METROLOGY FOR OLED MANUFACTURING USING PHOTOLUMINESCENCE SPECTROSCOPY
- Publication number 20210208077
- Publication date Jul 8, 2021
- Applied Materials, Inc.
- Avishek GHOSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE DETECTION FOR SUBSTRATE PROCESSING
- Publication number 20210018449
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- Todd EGAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...
- Publication number 20210005436
- Publication date Jan 7, 2021
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD PROCESS
- Publication number 20200399756
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Nagarajan RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMAGING REFLECTOMETER
- Publication number 20200355609
- Publication date Nov 12, 2020
- Appiied Materials, Inc,
- Guoheng Zhao
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

In-line monitoring of OLED layer thickness and dopant concentration

Spatial pattern loading measurement with imaging metrology

Surface roughness and emissivity determination

Optical metrology models for in-line film thickness measurements

Real-time detection of particulate matter during deposition chamber...

Metrology for OLED manufacturing using photoluminescence spectroscopy

Image-based in-situ process monitoring

Substrate process endpoint detection using machine learning

PECVD process

In-line monitoring of OLED layer thickness and dopant concentration

Autonomous substrate processing system

Metrology for OLED manufacturing using photoluminescence spectroscopy

PECVD process

Methods and systems to measure properties of products on a moving b...

Method and apparatus for detection of particle size in a fluid

Spectrum shaping devices and techniques for optical characterizatio...

In-situ full wafer metrology system

Imaging reflectometer

Particle detection for substrate processing

Metrology for OLED manufacturing using photoluminescence spectroscopy

Metrology system for substrate deformation measurement

Optical stack deposition and on-board metrology

Particle detection for substrate processing

Imaging reflectometer

PECVD process

Apparatus, systems, and methods for temperature control of substrat...

Temperature control for additive manufacturing

Equipment cleaning apparatus and method

In-situ metrology method for thickness measurement during PECVD pro...

Monitoring system for deposition and method of operation thereof

Patents Applicationslast 30 patents

MULTI-TARGET DESIGN FOR IN-SITU ANALYSIS OF SEMICONDUCTOR FABRICATI...

REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...

IN-SITU REFLECTOMETRY FOR REAL-TIME PROCESS CONTROL

IN-LINE MONITORING OF OLED LAYER THICKNESS AND DOPANT CONCENTRATION

SURFACE ROUGHNESS AND EMISSIVITY DETERMINATION

IN-CHAMBER METROLOGY OF SUBSTRATES FOR PROCESS CHARACTERIZATION AND...

FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...

AUTONOMOUS SUBSTRATE PROCESSING SYSTEM

METROLOGY FOR OLED MANUFACTURING USING PHOTOLUMINESCENCE SPECTROSCOPY

METHODS AND SYSTEMS TO MEASURE PROPERTIES OF MOVING PRODUCTS IN DEV...

PECVD PROCESS

MONITORING OF DEPOSITED OR ETCHED FILM THICKNESS USING IMAGE-BASED...

METHOD AND APPARATUS FOR DETECTION OF PARTICLE SIZE IN A FLUID

SYSTEM AND METHOD TO MAP THICKNESS VARIATIONS OF SUBSTRATES INMANUF...

SUBSTRATE PROCESS ENDPOINT DETECTION USING MACHINE LEARNING

OBTAINING SUBSTRATE METROLOGY MEASUREMENT VALUES USING MACHINE LEAR...

IMAGE-BASED IN-SITU PROCESS MONITORING

SPATIAL PATTERN LOADING MEASUREMENT WITH IMAGING METROLOGY

OPTICAL METROLOGY MODELS FOR IN-LINE FILM THICKNESS MEASUREMENTS

AUTONOMOUS SUBSTRATE PROCESSING SYSTEM

METHODS AND SYSTEMS TO MEASURE PROPERTIES OF PRODUCTS ON A MOVING B...

METHOD AND APPARATUS FOR DETECTION OF PARTICLE SIZE IN A FLUID

IN-SITU FULL WAFER METROLOGY SYSTEM

IN-LINE MONITORING OF OLED LAYER THICKNESS AND DOPANT CONCENTRATION

SPECTRUM SHAPING DEVICES AND TECHNIQUES FOR OPTICAL CHARACTERIZATIO...

METROLOGY FOR OLED MANUFACTURING USING PHOTOLUMINESCENCE SPECTROSCOPY

PARTICLE DETECTION FOR SUBSTRATE PROCESSING

REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...

PECVD PROCESS

IMAGING REFLECTOMETER