Todd J. Bednarek

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Southbury, CT, US

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for improved trajectory planning and execution
- Patent number 7,389,155
- Issue date Jun 17, 2008
- ASML Holding N.V.
- Daniel Galburt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle focus measurement system using multiple interferometric beams
- Patent number 7,016,051
- Issue date Mar 21, 2006
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle focus measurement method using multiple interferometric beams
- Patent number 6,934,005
- Issue date Aug 23, 2005
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle focus measurement system using multiple interferometric beams
- Patent number 6,850,330
- Issue date Feb 1, 2005
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, system, and computer program product for improved trajector...
- Patent number 6,845,287
- Issue date Jan 18, 2005
- ASML Holding N.V.
- Daniel Galburt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method and system for improved trajectory planning and execution
- Publication number 20050077484
- Publication date Apr 14, 2005
- Daniel Galburt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle focus measurement system using multiple interferometric beams
- Publication number 20050062980
- Publication date Mar 24, 2005
- ASML Holding N.V.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, system, and computer program product for improved trajector...
- Publication number 20040098160
- Publication date May 20, 2004
- ASML US, Inc.
- Daniel Galburt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle focus measurement method using multiple interferometric beams
- Publication number 20040048400
- Publication date Mar 11, 2004
- ASML US, Inc.
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle focus measurement system using multiple interferometric beams
- Publication number 20040048174
- Publication date Mar 11, 2004
- Stephen Roux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY