Tohru Ogawa

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern formation method and method and apparatus for production of...
- Patent number 6,673,526
- Issue date Jan 6, 2004
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, semiconductor device, and photomask
- Patent number 6,611,317
- Issue date Aug 26, 2003
- Asahi Glass Company, Limited
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming polycrystalline silicon layer on substrate and su...
- Patent number 6,071,765
- Issue date Jun 6, 2000
- Sony Corporation
- Takashi Noguchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of forming polycrystalline silicon layer on substrate and su...
- Patent number 5,869,803
- Issue date Feb 9, 1999
- Sony Corporation
- Takashi Noguchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor device containing Si, O and N anti-reflective layer
- Patent number 5,698,352
- Issue date Dec 16, 1997
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for production of micropattern utilizing antireflection film
- Patent number 5,677,111
- Issue date Oct 14, 1997
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the formation of a metal pattern
- Patent number 5,670,297
- Issue date Sep 23, 1997
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a photoresist pattern using an anti-reflective
- Patent number 5,648,202
- Issue date Jul 15, 1997
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflective layer used to form a semiconductor device
- Patent number 5,641,607
- Issue date Jun 24, 1997
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern projecting method
- Patent number 5,627,625
- Issue date May 6, 1997
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a resist pattern by using a silicon carbide anti-...
- Patent number 5,591,566
- Issue date Jan 7, 1997
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming polycrystalline silicon layer on substrate by lar...
- Patent number 5,529,951
- Issue date Jun 25, 1996
- Sony Corporation
- Takashi Noguchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of forming a resist pattern by using an anti-reflective layer
- Patent number 5,472,829
- Issue date Dec 5, 1995
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a resist pattern using an anti-reflective layer
- Patent number 5,472,827
- Issue date Dec 5, 1995
- Sony Corporation
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor light exposure device
- Patent number 5,473,409
- Issue date Dec 5, 1995
- Sony Corporation
- Minoru Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High precision stepping aligner having a spiral stepping pattern
- Patent number 5,311,282
- Issue date May 10, 1994
- Sony Corporation
- Atsushi Someya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tohru Ogawa

Person

Patents Grantslast 30 patents

Pattern formation method and method and apparatus for production of...

Exposure apparatus, semiconductor device, and photomask

Method of forming polycrystalline silicon layer on substrate and su...

Method of forming polycrystalline silicon layer on substrate and su...

Semiconductor device containing Si, O and N anti-reflective layer

Process for production of micropattern utilizing antireflection film

Process for the formation of a metal pattern

Method of forming a photoresist pattern using an anti-reflective

Anti-reflective layer used to form a semiconductor device

Pattern projecting method

Method of forming a resist pattern by using a silicon carbide anti-...

Method of forming polycrystalline silicon layer on substrate by lar...

Method of forming a resist pattern by using an anti-reflective layer

Method of forming a resist pattern using an anti-reflective layer

Semiconductor light exposure device

High precision stepping aligner having a spiral stepping pattern