Toi Yue Becky Leung

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Gate electrode dopant activation method for semiconductor manufactu...
- Patent number 7,611,976
- Issue date Nov 3, 2009
- Applied Materials, Inc.
- Yi Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate electrode dopant activation method for semiconductor manufactu...
- Patent number 7,078,302
- Issue date Jul 18, 2006
- Applied Materials, Inc.
- Yi Ma
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
- Publication number 20100276391
- Publication date Nov 4, 2010
- Applied Materials, Inc.
- MICHAEL N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK ETCH PROCESS
- Publication number 20080179282
- Publication date Jul 31, 2008
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY