Toko Konishi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for treating semiconductor substrates
- Patent number 6,431,183
- Issue date Aug 13, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Toko Konishi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Semiconductor wafer processing apparatus and method of controlling...
- Patent number 6,391,113
- Issue date May 21, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Toko Konishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor workpiece cleaning method and apparatus
- Patent number 6,227,212
- Issue date May 8, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Toko Konishi
- B08 - CLEANING
Information Patent Grant
Semiconductor workpiece cleaning method and apparatus
- Patent number 6,145,519
- Issue date Nov 14, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Toko Konishi
- B08 - CLEANING
Information Patent Grant
Drying apparatus and method using IPA of a semiconductor wafer
- Patent number 6,032,382
- Issue date Mar 7, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Akinori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drying apparatus and method
- Patent number 5,996,242
- Issue date Dec 7, 1999
- Ryoden Semiconductor System Engineering Corporation
- Akinori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drying apparatus for processing surface of substrate
- Patent number 5,956,859
- Issue date Sep 28, 1999
- Ryoden Semiconductor System Emgineering Corporation
- Akinori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS

Toko Konishi

Person

Patents Grantslast 30 patents

Method for treating semiconductor substrates

Semiconductor wafer processing apparatus and method of controlling...

Semiconductor workpiece cleaning method and apparatus

Semiconductor workpiece cleaning method and apparatus

Drying apparatus and method using IPA of a semiconductor wafer

Drying apparatus and method

Drying apparatus for processing surface of substrate