Tom A. Kamp

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 12,087,561
- Issue date Sep 10, 2024
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 11,710,623
- Issue date Jul 25, 2023
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for edge ring wear compensation
- Patent number 11,538,713
- Issue date Dec 27, 2022
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 11,031,215
- Issue date Jun 8, 2021
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated atomic layer passivation in TCP etch chamber and in-situ...
- Patent number 10,950,454
- Issue date Mar 16, 2021
- Lam Research Corporation
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self limiting lateral atomic layer etch
- Patent number 10,714,354
- Issue date Jul 14, 2020
- Lam Research Corporation
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-based deposition for semiconductor processing
- Patent number 10,600,648
- Issue date Mar 24, 2020
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas plenum arrangement for improving etch non-uniformity in transfo...
- Patent number 10,431,426
- Issue date Oct 1, 2019
- Lam Research Corporation
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme edge sheath and wafer profile tuning through edge-localized...
- Patent number 10,163,610
- Issue date Dec 25, 2018
- Lam Research Corporation
- Saravanapriyan Sriraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shadow trim line edge roughness reduction
- Patent number 9,711,359
- Issue date Jul 18, 2017
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self limiting lateral atomic layer etch
- Patent number 9,620,376
- Issue date Apr 11, 2017
- Lam Research Corporation
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for improving wafer etch non-uniformity when us...
- Patent number 9,484,214
- Issue date Nov 1, 2016
- Lam Research Corporation
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated etch/clean for dielectric etch applications
- Patent number 9,396,961
- Issue date Jul 19, 2016
- Lam Research Corporation
- Reza Arghavani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling CD and CD uniformity with trim time and temperature on...
- Patent number 9,012,243
- Issue date Apr 21, 2015
- Lam Research Corporation
- Yoshie Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch method to reduce micro-loading
- Patent number 8,901,004
- Issue date Dec 2, 2014
- Lam Research Corporation
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling CD and CD uniformity with trim time and temperature on...
- Patent number 8,852,964
- Issue date Oct 7, 2014
- Lam Research Corporation
- Yoshie Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardmask trim method
- Patent number 8,124,540
- Issue date Feb 28, 2012
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardmask trim method
- Patent number 7,851,369
- Issue date Dec 14, 2010
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control and N/P loading in dual doped gat...
- Patent number 7,682,980
- Issue date Mar 23, 2010
- Lam Research Corporation
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control and N/P loading in dual doped gat...
- Patent number 7,186,661
- Issue date Mar 6, 2007
- Lam Research Corporation
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of silicon containing gas for CD and profile feature enhancemen...
- Patent number 7,098,141
- Issue date Aug 29, 2006
- Lam Research Corporation
- Thomas A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling etch depth
- Patent number 6,939,811
- Issue date Sep 6, 2005
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable temperature processes for tunable electrostatic chuck
- Patent number 6,921,724
- Issue date Jul 26, 2005
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP
- Publication number 20230317437
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSING RF COILS OF A PLASMA CHAMBER IN REVERSE SYNCHRONIZATION
- Publication number 20230282448
- Publication date Sep 7, 2023
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PULSING FREQUENCIES AND DUTY CYCLES OF PARAMETERS OF RF...
- Publication number 20230223236
- Publication date Jul 13, 2023
- LAM RESEARCH CORPORATION
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVAPORATIVE COOLING OF ELECTROSTATIC CHUCKS
- Publication number 20230178344
- Publication date Jun 8, 2023
- LAM RESEARCH CORPORATION
- John DREWERY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM, METHOD, AND USER INTERFACE FOR EDGE RING WEAR COMPENSATION
- Publication number 20230083737
- Publication date Mar 16, 2023
- LAM RESEARCH CORPORATION
- Tom A. KAMP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVEABLE EDGE RINGS WITH REDUCED CAPACITANCE VARIATION FOR SUBSTRAT...
- Publication number 20220270863
- Publication date Aug 25, 2022
- LAM RESEARCH CORPORATION
- Christopher Kimball
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVEABLE EDGE RINGS WITH REDUCED CAPACITANCE VARIATION FOR SUBSTRAT...
- Publication number 20220254612
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Christopher KIMBALL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU...
- Publication number 20210287909
- Publication date Sep 16, 2021
- LAM RESEARCH CORPORATION
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP
- Publication number 20210257195
- Publication date Aug 19, 2021
- LAM RESEARCH CORPORATION
- John Stephen DREWERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR EDGE RING WEAR COMPENSATION
- Publication number 20200373193
- Publication date Nov 26, 2020
- LAM RESEARCH CORPORATION
- Tom A. KAMP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP
- Publication number 20200105509
- Publication date Apr 2, 2020
- LAM RESEARCH CORPORATION
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR TRANSFERRING A PATTERN FROM AN ORGANIC MASK
- Publication number 20190378725
- Publication date Dec 12, 2019
- LAM RESEARCH CORPORATION
- Mirzafer ABATCHEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SQUARE SPACERS
- Publication number 20190189447
- Publication date Jun 20, 2019
- LAM RESEARCH CORPORATION
- Tom KAMP
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU...
- Publication number 20190043728
- Publication date Feb 7, 2019
- LAM RESEARCH CORPORATION
- Xiang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-BASED DEPOSITION FOR SEMICONDUCTOR PROCESSING
- Publication number 20180308693
- Publication date Oct 25, 2018
- LAM RESEARCH CORPORATION
- Tom A. KAMP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF LIMITING LATERAL ATOMIC LAYER ETCH
- Publication number 20170178917
- Publication date Jun 22, 2017
- LAM RESEARCH CORPORATION
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF LIMITING LATERAL ATOMIC LAYER ETCH
- Publication number 20170053808
- Publication date Feb 23, 2017
- LAM RESEARCH CORPORATION
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHADOW TRIM LINE EDGE ROUGHNESS REDUCTION
- Publication number 20170047224
- Publication date Feb 16, 2017
- LAM RESEARCH CORPORATION
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS PLENUM ARRANGEMENT FOR IMPROVING ETCH NON-UNIFORMITY IN TRANSFO...
- Publication number 20170032931
- Publication date Feb 2, 2017
- LAM RESEARCH CORPORATION
- Tom KAMP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE SHEATH AND WAFER PROFILE TUNING THROUGH EDGE-LOCALIZED...
- Publication number 20170018411
- Publication date Jan 19, 2017
- LAM RESEARCH CORPORATION
- Saravanapriyan Sriraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON ETCH AND CLEAN
- Publication number 20160181111
- Publication date Jun 23, 2016
- LAM RESEARCH CORPORATION
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED ETCH/CLEAN FOR DIELECTRIC ETCH APPLICATIONS
- Publication number 20160181117
- Publication date Jun 23, 2016
- LAM RESEARCH CORPORATION
- Reza Arghavani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVING WAFER ETCH NON-UNIFORMITY WHEN US...
- Publication number 20150235808
- Publication date Aug 20, 2015
- LAM RESEARCH CORPORATION
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING CD AND CD UNIFORMITY WITH TRIM TIME AND TEMPERATURE ON...
- Publication number 20150053347
- Publication date Feb 26, 2015
- LAM RESEARCH CORPORATION
- Yoshie Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING CD AND CD UNIFORMITY WITH TRIM TIME AND TEMPERATURE ON...
- Publication number 20140220709
- Publication date Aug 7, 2014
- LAM RESEARCH CORPORATION
- Yoshie Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK TRIM METHOD
- Publication number 20110049099
- Publication date Mar 3, 2011
- LAM RESEARCH CORPORATION
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCH METHOD TO REDUCE MICRO-LOADING
- Publication number 20110021029
- Publication date Jan 27, 2011
- Lam Research Corporation
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Residue free hardmask trim
- Publication number 20070281491
- Publication date Dec 6, 2007
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...
- Publication number 20070119545
- Publication date May 31, 2007
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...
- Publication number 20070117399
- Publication date May 24, 2007
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS

Tom A. Kamp

Person

Patents Grantslast 30 patents

Vacuum pump protection against deposition byproduct buildup

Vacuum pump protection against deposition byproduct buildup

System and method for edge ring wear compensation

Vacuum pump protection against deposition byproduct buildup

Integrated atomic layer passivation in TCP etch chamber and in-situ...

Self limiting lateral atomic layer etch

Silicon-based deposition for semiconductor processing

Gas plenum arrangement for improving etch non-uniformity in transfo...

Extreme edge sheath and wafer profile tuning through edge-localized...

Shadow trim line edge roughness reduction

Self limiting lateral atomic layer etch

Systems and methods for improving wafer etch non-uniformity when us...

Integrated etch/clean for dielectric etch applications

Controlling CD and CD uniformity with trim time and temperature on...

Plasma etch method to reduce micro-loading

Controlling CD and CD uniformity with trim time and temperature on...

Hardmask trim method

Hardmask trim method

Method to improve profile control and N/P loading in dual doped gat...

Method to improve profile control and N/P loading in dual doped gat...

Use of silicon containing gas for CD and profile feature enhancemen...

Apparatus and method for controlling etch depth

Variable temperature processes for tunable electrostatic chuck

Patents Applicationslast 30 patents

VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP

PULSING RF COILS OF A PLASMA CHAMBER IN REVERSE SYNCHRONIZATION

CONTROL OF PULSING FREQUENCIES AND DUTY CYCLES OF PARAMETERS OF RF...

EVAPORATIVE COOLING OF ELECTROSTATIC CHUCKS

SYSTEM, METHOD, AND USER INTERFACE FOR EDGE RING WEAR COMPENSATION

MOVEABLE EDGE RINGS WITH REDUCED CAPACITANCE VARIATION FOR SUBSTRAT...

MOVEABLE EDGE RINGS WITH REDUCED CAPACITANCE VARIATION FOR SUBSTRAT...

INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU...

VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP

SYSTEM AND METHOD FOR EDGE RING WEAR COMPENSATION

VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP

METHOD FOR TRANSFERRING A PATTERN FROM AN ORGANIC MASK

METHOD FOR FORMING SQUARE SPACERS

INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU...

SILICON-BASED DEPOSITION FOR SEMICONDUCTOR PROCESSING

SELF LIMITING LATERAL ATOMIC LAYER ETCH

SELF LIMITING LATERAL ATOMIC LAYER ETCH

SHADOW TRIM LINE EDGE ROUGHNESS REDUCTION

GAS PLENUM ARRANGEMENT FOR IMPROVING ETCH NON-UNIFORMITY IN TRANSFO...

EXTREME EDGE SHEATH AND WAFER PROFILE TUNING THROUGH EDGE-LOCALIZED...

SILICON ETCH AND CLEAN

INTEGRATED ETCH/CLEAN FOR DIELECTRIC ETCH APPLICATIONS

SYSTEMS AND METHODS FOR IMPROVING WAFER ETCH NON-UNIFORMITY WHEN US...

CONTROLLING CD AND CD UNIFORMITY WITH TRIM TIME AND TEMPERATURE ON...

CONTROLLING CD AND CD UNIFORMITY WITH TRIM TIME AND TEMPERATURE ON...

HARDMASK TRIM METHOD

PLASMA ETCH METHOD TO REDUCE MICRO-LOADING

Residue free hardmask trim

METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...

METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...