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Tomio Otsuki
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Ibaraki, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Sputtering target and manufacturing method therefor
Patent number
11,718,907
Issue date
Aug 8, 2023
JX Nippon Mining & Metals Corporation
Tomio Otsuki
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Copper alloy sputtering target and method for manufacturing same
Patent number
10,494,712
Issue date
Dec 3, 2019
JX Nippon Mining & Metals Corporation
Yasushi Morii
B22 - CASTING POWDER METALLURGY
Information
Patent Grant
High-purity copper-chromium alloy sputtering target
Patent number
10,297,429
Issue date
May 21, 2019
JX Nippon Mining & Metals Corporation
Tomio Otsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Copper alloy sputtering target
Patent number
10,276,356
Issue date
Apr 30, 2019
JX Nippon Mining & Metals Corporation
Tomio Otsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
High-purity copper-cobalt alloy sputtering target
Patent number
9,909,196
Issue date
Mar 6, 2018
JX Nippon Mining & Metals Corporation
Kenichi Nagata
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
High-purity copper sputtering target
Patent number
9,773,651
Issue date
Sep 26, 2017
JX Nippon Mining & Metals Corporation
Takeo Okabe
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Sputtering target and manufacturing method therefor
Patent number
9,704,695
Issue date
Jul 11, 2017
JX Nippon Mining & Metals Corporation
Kenichi Nagata
B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information
Patent Grant
Lanthanum target for sputtering
Patent number
9,382,612
Issue date
Jul 5, 2016
JX Nippon Mining & Metals Corporation
Shiro Tsukamoto
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Lanthanum target for sputtering
Patent number
9,347,130
Issue date
May 24, 2016
JX Nippon Mining & Metals Corporation
Shiro Tsukamoto
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
High purity copper—manganese alloy sputtering target
Patent number
9,165,750
Issue date
Oct 20, 2015
JX Nippon Mining & Metals Corporation
Kenichi Nagata
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
High-purity copper-manganese-alloy sputtering target
Patent number
9,090,970
Issue date
Jul 28, 2015
JX Nippon Mining & Metals Corporation
Kenichi Nagata
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Titanium target for sputtering
Patent number
8,663,440
Issue date
Mar 4, 2014
JX Nippon Mining & Metals Corporation
Shiro Tsukamoto
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Patents Applications
last 30 patents
Information
Patent Application
Sputtering Target and Manufacturing Method Therefor
Publication number
20230349035
Publication date
Nov 2, 2023
JX NIPPON MINING & METALS
Tomio Otsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR
Publication number
20200032385
Publication date
Jan 30, 2020
JX NIPPON MINING & METALS CORPORATION
Tomio Otsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
COPPER OR COPPER ALLOY TARGET CONTAINING ARGON OR HYDROGEN
Publication number
20190085442
Publication date
Mar 21, 2019
JX NIPPON MINING & METALS CORPORATION
Tomio Otsuki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
COPPER ALLOY SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME
Publication number
20170342546
Publication date
Nov 30, 2017
JX NIPPON MINING & METALS CORPORATION
Yasushi Morii
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
HIGH-PURITY COPPER-COBALT ALLOY SPUTTERING TARGET
Publication number
20150354047
Publication date
Dec 10, 2015
Kenichi Nagata
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
COPPER ALLOY SPUTTERING TARGET
Publication number
20150279638
Publication date
Oct 1, 2015
JX NIPPON MINING & METALS CORPORATION
Tomio Otsuki
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
High-Purity Copper Sputtering Target
Publication number
20140367253
Publication date
Dec 18, 2014
Takeo Okabe
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
HIGH-PURITY COPPER-CHROMIUM ALLOY SPUTTERING TARGET
Publication number
20140360869
Publication date
Dec 11, 2014
Tomio Otsuki
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR
Publication number
20140318953
Publication date
Oct 30, 2014
JX NIPPON MINING & METALS CORPORATION
Kenichi Nagata
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
High Purity Copper-Manganese Alloy Sputtering Target
Publication number
20140284211
Publication date
Sep 25, 2014
Kenichi Nagata
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
HIGH-PURITY COPPER-MANGANESE-ALLOY SPUTTERING TARGET
Publication number
20140158532
Publication date
Jun 12, 2014
JX NIPPON MINING & METALS CORPORATION
Kenichi Nagata
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Copper-Titanium Alloy Sputtering Target, Semiconductor Wiring Line...
Publication number
20140110849
Publication date
Apr 24, 2014
JX NIPPON MINING & METALS CORPORATION
Tomio Otsuki
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
High-Purity Copper-Manganese-Alloy Sputtering Target
Publication number
20140097084
Publication date
Apr 10, 2014
JX NIPPON MINING & METALS CORPORATION
Kenichi Nagata
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Titanium Target for Sputtering
Publication number
20120073964
Publication date
Mar 29, 2012
JX NIPPON MINING & METALS CORPORATION
Shiro Tsukamoto
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Lanthanum Target for Sputtering
Publication number
20110308940
Publication date
Dec 22, 2011
JX NIPPON MINING & METALS CORPORATION
Shiro Tsukamoto
B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information
Patent Application
Lanthanum Target for Sputtering
Publication number
20110290644
Publication date
Dec 1, 2011
JX NIPPON MINING & METALS CORPORATION
Shiro Tsukamoto
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...