Tomo Oikawa

Person

Ichihara-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for purifying resin for photolithography
- Patent number 9,023,982
- Issue date May 5, 2015
- Maruzen Petrochemical Co., LTD
- Tomo Oikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer and composition for semiconductor lithography and process...
- Patent number 8,859,180
- Issue date Oct 14, 2014
- Maruzen Petrochemical Co., LTD
- Tomo Oikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing resist copolymer having low molecular weight
- Patent number 8,759,462
- Issue date Jun 24, 2014
- Maruzen Petrochemical Co., LTD
- Tomo Oikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing a copolymer for photoresist
- Patent number 8,455,596
- Issue date Jun 4, 2013
- Maruzen Petrochemical Co., Ltd.
- Tomo Oikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer for immersion lithography and compositions
- Patent number 8,211,615
- Issue date Jul 3, 2012
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer and method for producing the polymer
- Patent number 8,163,852
- Issue date Apr 24, 2012
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,972,762
- Issue date Jul 5, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer for semiconductor lithography and process for production...
- Patent number 7,695,889
- Issue date Apr 13, 2010
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation process of copolymer for semiconductor lithography and...
- Patent number 7,045,582
- Issue date May 16, 2006
- Maruzen Petrochemical Co. Ltd.
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for production of N-vinyllactam
- Patent number 5,945,544
- Issue date Aug 31, 1999
- Maruzen Petrochemical Co., Ltd.
- Hideki Ohmori
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME...
- Publication number 20230242467
- Publication date Aug 3, 2023
- MARUZEN PETROCHEMICAL CO., LTD.
- Yuma HAKODA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PURIFYING RESIN FOR PHOTOLITHOGRAPHY
- Publication number 20140155564
- Publication date Jun 5, 2014
- Tomo OIKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING RESIST COPOLYMER HAVING LOW MOLECULAR WEIGHT
- Publication number 20130123446
- Publication date May 16, 2013
- MARUZEN PETROCHEMICAL CO., LTD.
- Tomo Oikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING A COPOLYMER FOR PHOTORESIST
- Publication number 20100222526
- Publication date Sep 2, 2010
- MARUZEN PETROCHEMICAL CO., LTD.
- Tomo Oikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Copolymer and composition for semiconductor lithography and process...
- Publication number 20100062371
- Publication date Mar 11, 2010
- Tomo Oikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS
- Publication number 20100047710
- Publication date Feb 25, 2010
- MARUZEN PETROCHEMICAL CO., LTD.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090233220
- Publication date Sep 17, 2009
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist polymer and method for producing the polymer
- Publication number 20090123868
- Publication date May 14, 2009
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Copolymer for semiconductor lithography and process for production...
- Publication number 20060257784
- Publication date Nov 16, 2006
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist polymer and method for producing the polymer
- Publication number 20050287474
- Publication date Dec 29, 2005
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Preparation process of copolymer for semiconductor lithography and...
- Publication number 20050131184
- Publication date Jun 16, 2005
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist polymer and method for producing the polymer
- Publication number 20040167298
- Publication date Aug 26, 2004
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tomo Oikawa

Person

Patents Grantslast 30 patents

Method for purifying resin for photolithography

Copolymer and composition for semiconductor lithography and process...

Method for producing resist copolymer having low molecular weight

Method for producing a copolymer for photoresist

Copolymer for immersion lithography and compositions

Resist polymer and method for producing the polymer

Positive resist composition and method of forming resist pattern

Copolymer for semiconductor lithography and process for production...

Preparation process of copolymer for semiconductor lithography and...

Process for production of N-vinyllactam

Patents Applicationslast 30 patents

HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME...

METHOD FOR PURIFYING RESIN FOR PHOTOLITHOGRAPHY

METHOD FOR PRODUCING RESIST COPOLYMER HAVING LOW MOLECULAR WEIGHT

METHOD FOR PRODUCING A COPOLYMER FOR PHOTORESIST

Copolymer and composition for semiconductor lithography and process...

COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Resist polymer and method for producing the polymer

Copolymer for semiconductor lithography and process for production...

Resist polymer and method for producing the polymer

Preparation process of copolymer for semiconductor lithography and...

Resist polymer and method for producing the polymer