Tomohide Katayama

Person

Ogasa-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Bottom antireflective coating forming composition
- Patent number 11,221,558
- Issue date Jan 11, 2022
- Merck Patent GmbH
- Hiroshi Hitokawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
High heat resistance resist composition and pattern forming method...
- Patent number 11,079,680
- Issue date Aug 3, 2021
- Merck Patent GmbH
- Masato Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive photoresist composition and pattern f...
- Patent number 11,029,599
- Issue date Jun 8, 2021
- Merck Patent GmbH
- Tetsumasa Takaichi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming fine pattern and method for forming fine pa...
- Patent number 10,859,916
- Issue date Dec 8, 2020
- Merck Patent GmbH
- Yoshihiro Miyamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing surface-modified silica nanoparticles, and sur...
- Patent number 10,106,428
- Issue date Oct 23, 2018
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hiroshi Yanagita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Upper surface antireflective film forming composition and pattern f...
- Patent number 8,852,855
- Issue date Oct 7, 2014
- AZ Electronic Materials USA Corp.
- Takayuki Sao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 8,039,202
- Issue date Oct 18, 2011
- AZ Electronic Materials USA Corp.
- Yu Sui
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURIN...
- Publication number 20230314943
- Publication date Oct 5, 2023
- Merck Patent GmbH
- Rui ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A NEGATIVE TONE LIFT OFF RESIST COMPOSITION COMPRISING AN ALKALI SO...
- Publication number 20220252977
- Publication date Aug 11, 2022
- Merck Patent GmbH
- Tomotsugu YANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIS...
- Publication number 20220163888
- Publication date May 26, 2022
- Merck Patent GmbH
- Kazumichi AKASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, SEMICONDUCTOR COMPOSITION COMPRISING POLYMER, AND METHOD F...
- Publication number 20220119568
- Publication date Apr 21, 2022
- Merck Patent GmbH
- Hiroshi HITOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
A NEGATIVE TONE LIFT OFF RESIST COMPOSITION COMPRISING AN ALKALI SO...
- Publication number 20200326623
- Publication date Oct 15, 2020
- Merck Patent GmbH
- Tomohide KATAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN F...
- Publication number 20190235382
- Publication date Aug 1, 2019
- RIDGEFIELD ACQUISITION
- TETSUMASA TAKAICHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING FORMING COMPOSITION
- Publication number 20190171107
- Publication date Jun 6, 2019
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Hiroshi HITOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PA...
- Publication number 20190079398
- Publication date Mar 14, 2019
- Yoshihiro MIYAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HIGH HEAT RESISTANCE RESIST COMPOSITION AND PATTERN FORMING METHOD...
- Publication number 20190033717
- Publication date Jan 31, 2019
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Masato SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING SURFACE-MODIFIED SILICA NANOPARTICLES, AND SUR...
- Publication number 20170190586
- Publication date Jul 6, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- HIROSHI YANAGITA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
UPPER SURFACE ANTIREFLECTIVE FILM FORMING COMPOSITION AND PATTERN F...
- Publication number 20140030661
- Publication date Jan 30, 2014
- AZ Electronic Materials USA Corp.
- Takayuki Sao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATING SOLUTION AND METHOD EMPLOYING THE SAME FOR TREAT...
- Publication number 20110165523
- Publication date Jul 7, 2011
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive -Working Photoimageable Bottom Antireflective Coating
- Publication number 20080090184
- Publication date Apr 17, 2008
- Yu Sui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoimageable bottom antireflective coating
- Publication number 20050214674
- Publication date Sep 29, 2005
- Yu Sui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tomohide Katayama

Person

Patents Grantslast 30 patents

Bottom antireflective coating forming composition

High heat resistance resist composition and pattern forming method...

Chemically amplified positive photoresist composition and pattern f...

Composition for forming fine pattern and method for forming fine pa...

Method for producing surface-modified silica nanoparticles, and sur...

Upper surface antireflective film forming composition and pattern f...

Positive-working photoimageable bottom antireflective coating

Patents Applicationslast 30 patents

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURIN...

A NEGATIVE TONE LIFT OFF RESIST COMPOSITION COMPRISING AN ALKALI SO...

POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIS...

POLYMER, SEMICONDUCTOR COMPOSITION COMPRISING POLYMER, AND METHOD F...

A NEGATIVE TONE LIFT OFF RESIST COMPOSITION COMPRISING AN ALKALI SO...

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN F...

BOTTOM ANTIREFLECTIVE COATING FORMING COMPOSITION

COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PA...

HIGH HEAT RESISTANCE RESIST COMPOSITION AND PATTERN FORMING METHOD...

METHOD FOR PRODUCING SURFACE-MODIFIED SILICA NANOPARTICLES, AND SUR...

UPPER SURFACE ANTIREFLECTIVE FILM FORMING COMPOSITION AND PATTERN F...

SUBSTRATE TREATING SOLUTION AND METHOD EMPLOYING THE SAME FOR TREAT...

Positive -Working Photoimageable Bottom Antireflective Coating

Positive-working photoimageable bottom antireflective coating