Tomohiko Abe

Person

Numazu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam lens apparatus, charged particle beam column,...
- Patent number 10,049,854
- Issue date Aug 14, 2018
- Intel Corporation
- Tomohiko Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun assembly
- Patent number 7,544,951
- Issue date Jun 9, 2009
- NuFlare Technology, Inc.
- Rodney Kendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode-ray tube and cathode-ray tube manufacturing method
- Patent number 6,858,977
- Issue date Feb 22, 2005
- Sony Corporation
- Tsuneharu Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,646,275
- Issue date Nov 11, 2003
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic deflector for electron beam exposure apparatus
- Patent number 6,509,568
- Issue date Jan 21, 2003
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,486,479
- Issue date Nov 26, 2002
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge-particle beam lithography system of blanking aperture array...
- Patent number 6,465,796
- Issue date Oct 15, 2002
- Advantest Corporation
- Takeshi Haraguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electrostatic deflector, for electron beam exposure apparatus, with...
- Patent number 6,268,606
- Issue date Jul 31, 2001
- Advantest Corporation
- Tomohiko Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,242,751
- Issue date Jun 5, 2001
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for exposing an exposure pattern on an object by...
- Patent number 6,118,129
- Issue date Sep 12, 2000
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing an electrostatic deflector
- Patent number 6,055,719
- Issue date May 2, 2000
- Fujitsu Limited
- Yoshihisa Ooaeh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,977,548
- Issue date Nov 2, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,969,365
- Issue date Oct 19, 1999
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of providing changed particle beam exposure in which represe...
- Patent number 5,965,895
- Issue date Oct 12, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,949,078
- Issue date Sep 7, 1999
- Fujitsu Limited
- Yoshihisa Ooaeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system
- Patent number 5,920,077
- Issue date Jul 6, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,872,366
- Issue date Feb 16, 1999
- Fujitsu Limited
- Yoshihisa Ooaeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 5,841,145
- Issue date Nov 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle exposure apparatus, and a charged particle exposur...
- Patent number 5,770,862
- Issue date Jun 23, 1998
- Fujitsu Ltd.
- Yoshihisa Ooaeh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,757,015
- Issue date May 26, 1998
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,721,432
- Issue date Feb 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,719,402
- Issue date Feb 17, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,614,725
- Issue date Mar 25, 1997
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Block exposure pattern data extracting system and method for charge...
- Patent number 5,590,048
- Issue date Dec 31, 1996
- Fujitsu Limited
- Tomohiko Abe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,546,319
- Issue date Aug 13, 1996
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,528,048
- Issue date Jun 18, 1996
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Blanking aperture array type charged particle beam exposure
- Patent number 5,430,304
- Issue date Jul 4, 1995
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method of exposing a patt...
- Patent number 5,391,886
- Issue date Feb 21, 1995
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure apparatus employing blanking aperture array
- Patent number 5,359,202
- Issue date Oct 25, 1994
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system using charged-particle beam and method of using...
- Patent number 5,304,811
- Issue date Apr 19, 1994
- Fujitsu Ltd.
- Akio Yamada
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM LENS APPARATUS, CHARGED PARTICLE BEAM COLUMN,...
- Publication number 20170213689
- Publication date Jul 27, 2017
- Advantest Corporation
- Tomohiko ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nonaqueous Electrolyte Rechargeable Battery Having Electrode Contai...
- Publication number 20130252096
- Publication date Sep 26, 2013
- Japan Carlit Co., Ltd.
- Ryuta Kobayakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nonaqueous Electrolyte Rechargeable Battery Having Electrode Contai...
- Publication number 20130252102
- Publication date Sep 26, 2013
- Japan Carlit Co., Ltd.
- Ryuta Kobayakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron gun assembly
- Publication number 20080023642
- Publication date Jan 31, 2008
- NuFLARE TECHNOLOGY, INC.
- Rodney Rendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam exposure system and method
- Publication number 20030025088
- Publication date Feb 6, 2003
- FUJITSU LIMITED
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Application
Cathode-ray tube and cathode-ray tube manufacturing method
- Publication number 20030015954
- Publication date Jan 23, 2003
- Tsuneharu Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic deflector for electron beam exposure apparatus
- Publication number 20020020354
- Publication date Feb 21, 2002
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic deflector for electron beam exposure apparatus
- Publication number 20010045528
- Publication date Nov 29, 2001
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-particle-beam exposure device and charged-particle-beam exp...
- Publication number 20010013581
- Publication date Aug 16, 2001
- Akio Takemoto
- B82 - NANO-TECHNOLOGY

Tomohiko Abe

Person

Patents Grantslast 30 patents

Charged particle beam lens apparatus, charged particle beam column,...

Electron gun assembly

Cathode-ray tube and cathode-ray tube manufacturing method

Charged particle beam exposure system and method

Electrostatic deflector for electron beam exposure apparatus

Charged particle beam exposure system and method

Charge-particle beam lithography system of blanking aperture array...

Electrostatic deflector, for electron beam exposure apparatus, with...

Charged-particle-beam exposure device and charged-particle-beam exp...

Method and system for exposing an exposure pattern on an object by...

Method for manufacturing an electrostatic deflector

Charged particle beam exposure system and method

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of providing changed particle beam exposure in which represe...

Charged-particle-beam exposure device and charged-particle-beam exp...

Charged particle beam exposure system

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of and system for exposing pattern on object by charged part...

Charged particle exposure apparatus, and a charged particle exposur...

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Charged particle beam exposure system and method

Block exposure pattern data extracting system and method for charge...

Method of and system for charged particle beam exposure

Charged particle beam exposure system and method

Blanking aperture array type charged particle beam exposure

Charged particle beam exposure system and method of exposing a patt...

Electron beam exposure apparatus employing blanking aperture array

Lithography system using charged-particle beam and method of using...

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM LENS APPARATUS, CHARGED PARTICLE BEAM COLUMN,...

Nonaqueous Electrolyte Rechargeable Battery Having Electrode Contai...

Nonaqueous Electrolyte Rechargeable Battery Having Electrode Contai...

Electron gun assembly

Charged particle beam exposure system and method

Cathode-ray tube and cathode-ray tube manufacturing method

Electrostatic deflector for electron beam exposure apparatus

Electrostatic deflector for electron beam exposure apparatus

Charged-particle-beam exposure device and charged-particle-beam exp...