Tomohiko Kitajima

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selection gate separation for 3D NAND
- Patent number 12,148,475
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Chang Seok Kang
- G11 - INFORMATION STORAGE
Information Patent Grant
Sequential plasma and thermal treatment
- Patent number 12,142,475
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Confined charge trap layer
- Patent number 11,930,637
- Issue date Mar 12, 2024
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional dynamic random access memory (DRAM) and methods o...
- Patent number 11,818,877
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Chang Seok Kang
Information Patent Grant
3D DRAM structure with high mobility channel
- Patent number 11,749,315
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- G11 - INFORMATION STORAGE
Information Patent Grant
3-d dram cell with mechanical stability
- Patent number 11,594,537
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3-D DRAM structures and methods of manufacture
- Patent number 11,587,930
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D-NAND memory cell structure
- Patent number 11,587,796
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory cell fabrication for 3D NAND applications
- Patent number 11,574,924
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- ChangSeok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for three dimensional NAND structure fabrication
- Patent number 11,545,504
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D NAND etch
- Patent number 11,515,170
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for three dimensional NAND structure fabrication
- Patent number 11,430,801
- Issue date Aug 30, 2022
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D dram structure with high mobility channel
- Patent number 11,295,786
- Issue date Apr 5, 2022
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D-NAND mold
- Patent number 11,189,635
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory cell fabrication for 3D nand applications
- Patent number 11,158,650
- Issue date Oct 26, 2021
- Applied Materials, Inc.
- ChangSeok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for three dimensional NAND structure fabrication
- Patent number 10,998,329
- Issue date May 4, 2021
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for three-dimensional NAND structure fabrication
- Patent number 10,964,717
- Issue date Mar 30, 2021
- Applied Materials, Inc.
- Sung-Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D NAND etch
- Patent number 10,886,140
- Issue date Jan 5, 2021
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing with measurement prior to deposition of outer layer
- Patent number 10,651,098
- Issue date May 12, 2020
- Applied Materials, Inc.
- Tomohiko Kitajima
- B24 - GRINDING POLISHING
Information Patent Grant
Double sided buff module for post CMP cleaning
- Patent number 10,229,842
- Issue date Mar 12, 2019
- Applied Materials, Inc.
- Clinton Sakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing with pre deposition spectrum
- Patent number 9,811,077
- Issue date Nov 7, 2017
- Applied Materials, Inc.
- Tomohiko Kitajima
- G05 - CONTROLLING REGULATING
Information Patent Grant
Polishing with eddy current feed meaurement prior to deposition of...
- Patent number 9,362,186
- Issue date Jun 7, 2016
- Applied Materials, Inc.
- Tomohiko Kitajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature control of chemical mechanical polishing
- Patent number 9,005,999
- Issue date Apr 14, 2015
- Applied Materials, Inc.
- Kun Xu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEQUENTIAL PLASMA AND THERMAL TREATMENT
- Publication number 20250037989
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFINED CHARGE TRAP LAYER
- Publication number 20240206172
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON MOLD FOR DRAM CAPACITOR
- Publication number 20240038833
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Fredrick Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING A DOPED HARDMASK
- Publication number 20240021433
- Publication date Jan 18, 2024
- Applied Materials, Inc.
- Scott FALK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...
- Publication number 20230420232
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Tomohiko Kitajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...
- Publication number 20230369031
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Tomohiko Kitajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIRECT WORD LINE CONTACT AND METHODS OF MANUFACTURE FOR 3D MEMORY
- Publication number 20230371246
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Chang Seok Kang
Information Patent Application
STRUCTURE AND FABRICATION METHOD OF HIGH VOLTAGE MOSFET WITH A VERT...
- Publication number 20230317845
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Changseok KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NAND CELL STRUCTURE WITH CHARGE TRAP CUT
- Publication number 20230164993
- Publication date May 25, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3-D DRAM STRUCTURES AND METHODS OF MANUFACTURE
- Publication number 20230157004
- Publication date May 18, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
L-TYPE WORDLINE CONNECTION STRUCTURE FOR THREE-DIMENSIONAL MEMORY
- Publication number 20230146831
- Publication date May 11, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE DIMENSIONAL MEMORY DEVICE AND METHOD OF FABRICATION
- Publication number 20230101155
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-DIMENSIONAL DYNAMIC RANDOM ACCESS MEMORY (DRAM) AND METHODS O...
- Publication number 20230096309
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Chang Seok KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTION GATE STRUCTURE AND FABRICATION METHOD FOR 3D MEMORY
- Publication number 20230040627
- Publication date Feb 9, 2023
- Applied Materials, Inc.
- Chang Seok Kang
- G11 - INFORMATION STORAGE
Information Patent Application
REDUCED STRAIN Si/SiGe HETEROEPITAXY STACKS FOR 3D DRAM
- Publication number 20230012819
- Publication date Jan 19, 2023
- Applied Materials, Inc.
- John Byron Tolle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLY-SILICON BASED WORD LINE FOR 3D MEMORY
- Publication number 20220367560
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTION GATE SEPARATION FOR 3D NAND
- Publication number 20220319601
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Chang Seok Kang
- G11 - INFORMATION STORAGE
Information Patent Application
METHODS AND STRUCTURES FOR THREE-DIMENSIONAL DYNAMIC RANDOM-ACCESS...
- Publication number 20220285362
- Publication date Sep 8, 2022
- Fredrick David FISHBURN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEQUENTIAL PLASMA AND THERMAL TREATMENT
- Publication number 20220262619
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Ning Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D DRAM STRUCTURE WITH HIGH MOBILITY CHANNEL
- Publication number 20220108728
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Chang Seok Kang
- G11 - INFORMATION STORAGE
Information Patent Application
SELECTION GATE SEPARATION FOR 3D NAND
- Publication number 20220059555
- Publication date Feb 24, 2022
- Applied Material, Inc.
- Chang Seok Kang
- G11 - INFORMATION STORAGE
Information Patent Application
3-D DRAM CELL WITH MECHANICAL STABILITY
- Publication number 20220005810
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFINED CHARGE TRAP LAYER
- Publication number 20210399011
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION
- Publication number 20210257375
- Publication date Aug 19, 2021
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3-D DRAM STRUCTURES AND METHODS OF MANUFACTURE
- Publication number 20210249415
- Publication date Aug 12, 2021
- Applied Materials, Inc.
- CHANG SEOK KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D-NAND Memory Cell Structure
- Publication number 20210233779
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Chang Seok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION
- Publication number 20210233918
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY CELL FABRICATION FOR 3D NAND APPLICATIONS
- Publication number 20210217773
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- ChangSeok KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D NAND Etch
- Publication number 20210118691
- Publication date Apr 22, 2021
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION
- Publication number 20200373310
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS

Tomohiko Kitajima

Person

Patents Grantslast 30 patents

Selection gate separation for 3D NAND

Sequential plasma and thermal treatment

Confined charge trap layer

Three-dimensional dynamic random access memory (DRAM) and methods o...

3D DRAM structure with high mobility channel

3-d dram cell with mechanical stability

3-D DRAM structures and methods of manufacture

3D-NAND memory cell structure

Memory cell fabrication for 3D NAND applications

Methods and apparatus for three dimensional NAND structure fabrication

3D NAND etch

Methods and apparatus for three dimensional NAND structure fabrication

3D dram structure with high mobility channel

3D-NAND mold

Memory cell fabrication for 3D nand applications

Methods and apparatus for three dimensional NAND structure fabrication

Methods and apparatus for three-dimensional NAND structure fabrication

3D NAND etch

Polishing with measurement prior to deposition of outer layer

Double sided buff module for post CMP cleaning

Polishing with pre deposition spectrum

Polishing with eddy current feed meaurement prior to deposition of...

Temperature control of chemical mechanical polishing

Patents Applicationslast 30 patents

SEQUENTIAL PLASMA AND THERMAL TREATMENT

CONFINED CHARGE TRAP LAYER

CARBON MOLD FOR DRAM CAPACITOR

FORMING A DOPED HARDMASK

INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...

INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...

DIRECT WORD LINE CONTACT AND METHODS OF MANUFACTURE FOR 3D MEMORY

STRUCTURE AND FABRICATION METHOD OF HIGH VOLTAGE MOSFET WITH A VERT...

NAND CELL STRUCTURE WITH CHARGE TRAP CUT

3-D DRAM STRUCTURES AND METHODS OF MANUFACTURE

L-TYPE WORDLINE CONNECTION STRUCTURE FOR THREE-DIMENSIONAL MEMORY

THREE DIMENSIONAL MEMORY DEVICE AND METHOD OF FABRICATION

THREE-DIMENSIONAL DYNAMIC RANDOM ACCESS MEMORY (DRAM) AND METHODS O...

SELECTION GATE STRUCTURE AND FABRICATION METHOD FOR 3D MEMORY

REDUCED STRAIN Si/SiGe HETEROEPITAXY STACKS FOR 3D DRAM

POLY-SILICON BASED WORD LINE FOR 3D MEMORY

SELECTION GATE SEPARATION FOR 3D NAND

METHODS AND STRUCTURES FOR THREE-DIMENSIONAL DYNAMIC RANDOM-ACCESS...

SEQUENTIAL PLASMA AND THERMAL TREATMENT

3D DRAM STRUCTURE WITH HIGH MOBILITY CHANNEL

SELECTION GATE SEPARATION FOR 3D NAND

3-D DRAM CELL WITH MECHANICAL STABILITY

CONFINED CHARGE TRAP LAYER

METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION

3-D DRAM STRUCTURES AND METHODS OF MANUFACTURE

3D-NAND Memory Cell Structure

METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION

MEMORY CELL FABRICATION FOR 3D NAND APPLICATIONS

3D NAND Etch

METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION