Tomohiko NIIZEKI

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method, substrate processing apparatus, and substrate proce...
- Patent number 12,112,954
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Learning device, inference device, and learned model
- Patent number 11,922,307
- Issue date Mar 5, 2024
- PREFERRED NETWORKS, INC.
- Kosuke Nakago
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for etching film and plasma processing apparatus
- Patent number 11,637,003
- Issue date Apr 25, 2023
- Tokyo Electron Limited
- Tomohiko Niizeki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250022706
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADJUSTING METHOD AND ADJUSTING DEVICE
- Publication number 20240211753
- Publication date Jun 27, 2024
- Preferred Networks, Inc.
- Kosuke NAKAGO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Low-Temperature Etch
- Publication number 20240112919
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230386800
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20230245898
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20230215707
- Publication date Jul 6, 2023
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...
- Publication number 20210233778
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LEARNING DEVICE, INFERENCE DEVICE, AND LEARNED MODEL
- Publication number 20210209413
- Publication date Jul 8, 2021
- Preferred Networks, Inc.
- Kosuke NAKAGO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210202233
- Publication date Jul 1, 2021
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20210151301
- Publication date May 20, 2021
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200279753
- Publication date Sep 3, 2020
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS

Tomohiko NIIZEKI

Person

Patents Grantslast 30 patents

Etching method, substrate processing apparatus, and substrate proce...

Learning device, inference device, and learned model

Method for etching film and plasma processing apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

ADJUSTING METHOD AND ADJUSTING DEVICE

Low-Temperature Etch

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

METHOD FOR ETCHING FILM AND PLASMA PROCESSING APPARATUS

ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...

LEARNING DEVICE, INFERENCE DEVICE, AND LEARNED MODEL

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR ETCHING FILM AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS