Tomohiro Iseki

Person

Koshi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Developing method, developing apparatus, and computer-readable reco...
- Patent number 10,901,320
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Tomohiro Iseki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 10,606,177
- Issue date Mar 31, 2020
- Tokyo Electron Limited
- Tomohiro Iseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for photo-lithographic processing in semiconductor device ma...
- Patent number 10,211,050
- Issue date Feb 19, 2019
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing method, developing apparatus, and computer-readable reco...
- Patent number 10,120,286
- Issue date Nov 6, 2018
- Tokyo Electron Limited
- Tomohiro Iseki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Developing method, developing apparatus, and computer-readable stor...
- Patent number 9,952,512
- Issue date Apr 24, 2018
- Tokyo Electron Limited
- Hirofumi Takeguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light irradiation apparatus
- Patent number 9,899,243
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Masahide Tadokoro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing method, developing apparatus and storage medium
- Patent number 9,690,202
- Issue date Jun 27, 2017
- Tokyo Electron Limited
- Yuichi Terashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bubble removing method, bubble removing apparatus, degassing appara...
- Patent number 9,649,577
- Issue date May 16, 2017
- Tokyo Electron Limited
- Tomohiro Iseki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Substrate processing method, substrate processing apparatus and non...
- Patent number 9,627,232
- Issue date Apr 18, 2017
- Tokyo Electron Limited
- Keiichi Tanaka
- B08 - CLEANING
Information Patent Grant
Coating treatment method, coating treatment apparatus, and computer...
- Patent number 8,851,011
- Issue date Oct 7, 2014
- Tokyo Electron Limited
- Kousuke Yoshihara
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Coating treatment method and coating treatment apparatus
- Patent number 8,697,187
- Issue date Apr 15, 2014
- Tokyo Electron Limited
- Yoshiteru Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist coating apparatus
- Patent number 8,505,479
- Issue date Aug 13, 2013
- Tokyo Electron Limited
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating treatment method
- Patent number 8,496,991
- Issue date Jul 30, 2013
- Tokyo Electron Limited
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating treatment method, coating treatment apparatus, and computer...
- Patent number 8,414,972
- Issue date Apr 9, 2013
- Tokyo Electron Limited
- Kousuke Yoshihara
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Coating treatment method, coating treatment apparatus, and computer...
- Patent number 8,318,247
- Issue date Nov 27, 2012
- Tokyo Electron Limited
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist coating method and resist coating apparatus
- Patent number 8,225,738
- Issue date Jul 24, 2012
- Tokyo Electron Limited
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating treatment method
- Patent number 8,043,657
- Issue date Oct 25, 2011
- Tokyo Electron Limited
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist coating method and resist coating apparatus
- Patent number 7,906,173
- Issue date Mar 15, 2011
- Tokyo Electron Limited
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating treatment method and coating treatment apparatus
- Patent number 7,832,352
- Issue date Nov 16, 2010
- Tokyo Electron Limited
- Yoshiteru Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist coating method and resist coating apparatus
- Patent number 7,820,243
- Issue date Oct 26, 2010
- Tokyo Electron Limited
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hardening processing apparatus, hardening processing method, and co...
- Patent number 7,520,936
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Shinji Nagashima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Coating treatment apparatus and coating treatment method
- Patent number 7,479,190
- Issue date Jan 20, 2009
- Tokyo Electron Limited
- Yoshiteru Fukuda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Developing Method, Developing Apparatus, and Computer-Readable Reco...
- Publication number 20190056666
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Tomohiro ISEKI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Substrate Processing Apparatus, Substrate Processing Method, and St...
- Publication number 20190025704
- Publication date Jan 24, 2019
- TOKYO ELECTRON LIMITED
- Tomohiro ISEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20160358769
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT IRRADIATION APPARATUS
- Publication number 20160170316
- Publication date Jun 16, 2016
- TOKYO ELECTRON LIMITED
- Masahide Tadokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPING METHOD, DEVELOPING APPARATUS AND STORAGE MEDIUM
- Publication number 20160070171
- Publication date Mar 10, 2016
- TOKYO ELECTRON LIMITED
- Yuichi TERASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Device Manufacturing Method
- Publication number 20160049292
- Publication date Feb 18, 2016
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Developing Method, Developing Apparatus, and Computer-Readable Reco...
- Publication number 20160026087
- Publication date Jan 28, 2016
- TOKYO ELECTRON LIMITED
- Tomohiro ISEKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING METHOD, DEVELOPING APPARATUS, AND COMPUTER-READABLE STOR...
- Publication number 20150362839
- Publication date Dec 17, 2015
- TOKYO ELECTRON LIMITED
- Hirofumi TAKEGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BUBBLE REMOVING METHOD, BUBBLE REMOVING APPARATUS, DEGASSING APPARA...
- Publication number 20150096441
- Publication date Apr 9, 2015
- TOKYO ELECTRON LIMITED
- Tomohiro Iseki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND NON...
- Publication number 20140299161
- Publication date Oct 9, 2014
- TOKYO ELECTRON LIMITED
- Keiichi TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING TREATMENT METHOD, COATING TREATMENT APPARATUS, AND COMPUTER...
- Publication number 20130239887
- Publication date Sep 19, 2013
- TOKYO ELECTRON LIMITED
- Kousuke Yoshihara
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COATING TREATMENT METHOD
- Publication number 20120034792
- Publication date Feb 9, 2012
- TOKYO ELECTRON LIMITED
- Kousuke YOSHIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COATING METHOD AND RESIST COATING APPARATUS
- Publication number 20110146572
- Publication date Jun 23, 2011
- TOKYO ELECTRON LIMITED
- Kousuke YOSHIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING TREATMENT METHOD AND COATING TREATMENT APPARATUS
- Publication number 20110033626
- Publication date Feb 10, 2011
- TOKYO ELECTRON LIMITED
- Yoshiteru FUKUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COATING APPARATUS
- Publication number 20110005459
- Publication date Jan 13, 2011
- TOKYO ELECTRON LIMITED
- Kousuke YOSHIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE COATING METHOD AND SUBSTRATE COATING APPARATUS
- Publication number 20100151126
- Publication date Jun 17, 2010
- TOKYO ELECTRON LIMITED
- Tomohiro ISEKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING TREATMENT METHOD, COATING TREATMENT APPARATUS, AND COMPUTER...
- Publication number 20100112209
- Publication date May 6, 2010
- TOKYO ELECTRON LIMITED
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND COA...
- Publication number 20090291198
- Publication date Nov 26, 2009
- TOKYO ELECTRON LIMITED
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND COA...
- Publication number 20090226621
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Mitsuo YAMASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF TREATING SUBSTRATE AND COMPUTER STORAGE MEDIUM
- Publication number 20090181174
- Publication date Jul 16, 2009
- TOKYO ELECTRON LIMITED
- Kousuke YOSHIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING TREATMENT METHOD, COATING TREATMENT APPARATUS, AND COMPUTER...
- Publication number 20090087559
- Publication date Apr 2, 2009
- TOKYO ELECTRON LIMITED
- Kousuke Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating Treatment Method and Coating Treatment Apparatus
- Publication number 20080193654
- Publication date Aug 14, 2008
- TOKYO ELECTRON LIMITED
- Yoshiteru Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING TREATMENT METHOD
- Publication number 20080069948
- Publication date Mar 20, 2008
- TOKYO ELECTRON LIMITED
- Kousuke YOSHIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist coating method, resist coating apparatus and storage medium
- Publication number 20070254099
- Publication date Nov 1, 2007
- TOKYO ELECTRON LIMITED
- Kousuke YOSHIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COATING METHOD AND RESIST COATING APPARATUS
- Publication number 20070092642
- Publication date Apr 26, 2007
- TOKYO ELECTRON LIMITED
- Kousuke YOSHIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COATING METHOD AND RESIST COATING APPARATUS
- Publication number 20070092643
- Publication date Apr 26, 2007
- TOKYO ELECTRON LIMITED
- Kousuke YOSHIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating treatment apparatus and coating treatment method
- Publication number 20060068110
- Publication date Mar 30, 2006
- Yoshiteru Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hardening processing apparatus, hardening processing method, and co...
- Publication number 20040161548
- Publication date Aug 19, 2004
- TOKYO ELECTRON LIMITED
- Shinji Nagashima
- H01 - BASIC ELECTRIC ELEMENTS

Tomohiro Iseki

Person

Patents Grantslast 30 patents

Developing method, developing apparatus, and computer-readable reco...

Substrate processing apparatus, substrate processing method, and st...

Method for photo-lithographic processing in semiconductor device ma...

Developing method, developing apparatus, and computer-readable reco...

Developing method, developing apparatus, and computer-readable stor...

Light irradiation apparatus

Developing method, developing apparatus and storage medium

Bubble removing method, bubble removing apparatus, degassing appara...

Substrate processing method, substrate processing apparatus and non...

Coating treatment method, coating treatment apparatus, and computer...

Coating treatment method and coating treatment apparatus

Resist coating apparatus

Coating treatment method

Coating treatment method, coating treatment apparatus, and computer...

Coating treatment method, coating treatment apparatus, and computer...

Resist coating method and resist coating apparatus

Coating treatment method

Resist coating method and resist coating apparatus

Coating treatment method and coating treatment apparatus

Resist coating method and resist coating apparatus

Hardening processing apparatus, hardening processing method, and co...

Coating treatment apparatus and coating treatment method

Patents Applicationslast 30 patents

Developing Method, Developing Apparatus, and Computer-Readable Reco...

Substrate Processing Apparatus, Substrate Processing Method, and St...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

LIGHT IRRADIATION APPARATUS

DEVELOPING METHOD, DEVELOPING APPARATUS AND STORAGE MEDIUM

Semiconductor Device Manufacturing Method

Developing Method, Developing Apparatus, and Computer-Readable Reco...

DEVELOPING METHOD, DEVELOPING APPARATUS, AND COMPUTER-READABLE STOR...

BUBBLE REMOVING METHOD, BUBBLE REMOVING APPARATUS, DEGASSING APPARA...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND NON...

COATING TREATMENT METHOD, COATING TREATMENT APPARATUS, AND COMPUTER...

COATING TREATMENT METHOD

RESIST COATING METHOD AND RESIST COATING APPARATUS

COATING TREATMENT METHOD AND COATING TREATMENT APPARATUS

RESIST COATING APPARATUS

SUBSTRATE COATING METHOD AND SUBSTRATE COATING APPARATUS

COATING TREATMENT METHOD, COATING TREATMENT APPARATUS, AND COMPUTER...

COATING TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND COA...

COATING TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND COA...

METHOD OF TREATING SUBSTRATE AND COMPUTER STORAGE MEDIUM

COATING TREATMENT METHOD, COATING TREATMENT APPARATUS, AND COMPUTER...

Coating Treatment Method and Coating Treatment Apparatus

COATING TREATMENT METHOD

Resist coating method, resist coating apparatus and storage medium

RESIST COATING METHOD AND RESIST COATING APPARATUS

RESIST COATING METHOD AND RESIST COATING APPARATUS

Coating treatment apparatus and coating treatment method

Hardening processing apparatus, hardening processing method, and co...