Tomohiro Kakizawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition, polymer, and resist pattern-...
- Patent number 8,980,529
- Issue date Mar 17, 2015
- JSR Corporation
- Yasuhiko Matsuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive resin composition, method for forming a pattern...
- Patent number 8,765,355
- Issue date Jul 1, 2014
- JSR Corporation
- Takakazu Kimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, resist pattern formation met...
- Patent number 8,758,978
- Issue date Jun 24, 2014
- JSR Corporation
- Mitsuo Satou
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for pattern formation and resin composition for use in the m...
- Patent number 8,211,624
- Issue date Jul 3, 2012
- JSR Corporation
- Atsushi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20140363773
- Publication date Dec 11, 2014
- JSR Corporation
- Atsushi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-...
- Publication number 20130203000
- Publication date Aug 8, 2013
- JSR Corporation
- Yasuhiko MATSUDA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN...
- Publication number 20120276482
- Publication date Nov 1, 2012
- JSR Corporation
- Takakazu Kimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20120244478
- Publication date Sep 27, 2012
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION MET...
- Publication number 20120171612
- Publication date Jul 5, 2012
- JSR Corporation
- Mitsuo SATOU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120156621
- Publication date Jun 21, 2012
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...
- Publication number 20110223544
- Publication date Sep 15, 2011
- JSR Corporation
- Yuji YADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD
- Publication number 20110123936
- Publication date May 26, 2011
- JSR Corporation
- Masafumi HORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF I...
- Publication number 20100323292
- Publication date Dec 23, 2010
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE M...
- Publication number 20100190104
- Publication date Jul 29, 2010
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tomohiro Kakizawa

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition, polymer, and resist pattern-...

Radiation sensitive resin composition, method for forming a pattern...

Radiation-sensitive resin composition, resist pattern formation met...

Method for pattern formation and resin composition for use in the m...

Patents Applicationslast 30 patents

PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-...

RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN...

RESIST PATTERN FORMATION METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION MET...

RADIATION-SENSITIVE RESIN COMPOSITION

RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...

RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD

RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF I...

METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE M...