Tomohiro KOBAYASHI

Person

Jyoetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and patterning process
- Patent number 12,072,627
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,050,402
- Issue date Jul 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and patterning process
- Patent number 12,032,287
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and patterning process
- Patent number 11,994,798
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt compound, chemically amplified resist composition and pa...
- Patent number 11,762,287
- Issue date Sep 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,693,314
- Issue date Jul 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate protective film-forming composition and pattern forming p...
- Patent number 11,662,663
- Issue date May 30, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,592,287
- Issue date Feb 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,555,697
- Issue date Jan 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,448,962
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process
- Patent number 11,327,400
- Issue date May 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, making method, resist composition, and patterning process
- Patent number 10,234,757
- Issue date Mar 19, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process and resist composition
- Patent number 9,551,932
- Issue date Jan 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,519,213
- Issue date Dec 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
- Patent number 9,221,742
- Issue date Dec 29, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process, resist composition, polymer, and monomer
- Patent number 9,213,235
- Issue date Dec 15, 2015
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Nitrogen-containing monomer, polymer, resist composition, and patte...
- Patent number 9,207,534
- Issue date Dec 8, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process, resist composition, polymer, and monomer
- Patent number 9,182,668
- Issue date Nov 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process and resist composition
- Patent number 9,164,384
- Issue date Oct 20, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,122,152
- Issue date Sep 1, 2015
- Shin-Etsu Chemicals Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, resist composition and patterning process
- Patent number 9,122,155
- Issue date Sep 1, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,104,105
- Issue date Aug 11, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative pattern forming process
- Patent number 9,091,933
- Issue date Jul 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process and resist composition
- Patent number 9,081,290
- Issue date Jul 14, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Patterning process, resist composition, polymer, and polymerizable...
- Patent number 9,057,949
- Issue date Jun 16, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation of polymer, resulting polymer, resist composition, and...
- Patent number 8,957,160
- Issue date Feb 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, resist composition, and patterning process
- Patent number 8,956,803
- Issue date Feb 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorinated monomer of cyclic acetal structure, polymer, resist pro...
- Patent number 8,933,251
- Issue date Jan 13, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, chemically amplified resist composition, and patterning pr...
- Patent number 8,900,793
- Issue date Dec 2, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acid generator, chemically amplified resist composition, and patter...
- Patent number 8,900,796
- Issue date Dec 2, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20240377737
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Gentaro Hida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Material, Resist Composition, And Patterning Process
- Publication number 20240361691
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Monomer, Resist Material, Resist Composition, And Patterning Process
- Publication number 20240360069
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240053678
- Publication date Feb 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro Otomo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST MATERIAL AND PATTERN FORMING METHOD
- Publication number 20230296980
- Publication date Sep 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20230296981
- Publication date Sep 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Gentaro HIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230280651
- Publication date Sep 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD
- Publication number 20230244142
- Publication date Aug 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220236643
- Publication date Jul 28, 2022
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210200083
- Publication date Jul 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...
- Publication number 20210188770
- Publication date Jun 24, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...
- Publication number 20210149301
- Publication date May 20, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20210063873
- Publication date Mar 4, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20210063871
- Publication date Mar 4, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST
- Publication number 20200340806
- Publication date Oct 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200249571
- Publication date Aug 6, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE PROTECTIVE FILM-FORMING COMPOSITION AND PATTERN FORMING P...
- Publication number 20200133123
- Publication date Apr 30, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20190163065
- Publication date May 30, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20150346600
- Publication date Dec 3, 2015
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...
- Publication number 20150086926
- Publication date Mar 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140322650
- Publication date Oct 30, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND MONOMER
- Publication number 20140308614
- Publication date Oct 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140255843
- Publication date Sep 11, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140242518
- Publication date Aug 28, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140212808
- Publication date Jul 31, 2014
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20140199629
- Publication date Jul 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masaki OHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND MONOMER
- Publication number 20140199632
- Publication date Jul 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140199630
- Publication date Jul 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masaki OHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140011136
- Publication date Jan 9, 2014
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20130337383
- Publication date Dec 19, 2013
- Jun Hatakeyama
- B82 - NANO-TECHNOLOGY

Tomohiro KOBAYASHI

Person

Patents Grantslast 30 patents

Resist composition and patterning process

Resist composition and patterning process

Resist material and patterning process

Resist material and patterning process

Onium salt compound, chemically amplified resist composition and pa...

Resist composition and patterning process

Substrate protective film-forming composition and pattern forming p...

Method for measuring distance of diffusion of curing catalyst

Method for measuring distance of diffusion of curing catalyst

Resist composition and patterning process

Patterning process

Polymer, making method, resist composition, and patterning process

Patterning process and resist composition

Patterning process and resist composition

Sulfonium salt, chemically amplified resist composition, and patter...

Patterning process, resist composition, polymer, and monomer

Nitrogen-containing monomer, polymer, resist composition, and patte...

Patterning process, resist composition, polymer, and monomer

Patterning process and resist composition

Patterning process and resist composition

Sulfonium salt, resist composition and patterning process

Patterning process and resist composition

Negative pattern forming process

Patterning process and resist composition

Patterning process, resist composition, polymer, and polymerizable...

Preparation of polymer, resulting polymer, resist composition, and...

Sulfonium salt, resist composition, and patterning process

Fluorinated monomer of cyclic acetal structure, polymer, resist pro...

Polymer, chemically amplified resist composition, and patterning pr...

Acid generator, chemically amplified resist composition, and patter...

Patents Applicationslast 30 patents

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

Resist Material, Resist Composition, And Patterning Process

Monomer, Resist Material, Resist Composition, And Patterning Process

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST MATERIAL AND PATTERN FORMING METHOD

RESIST MATERIAL AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...

ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...

RESIST MATERIAL AND PATTERNING PROCESS

RESIST MATERIAL AND PATTERNING PROCESS

METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST

RESIST COMPOSITION AND PATTERNING PROCESS

SUBSTRATE PROTECTIVE FILM-FORMING COMPOSITION AND PATTERN FORMING P...

PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...

PATTERNING PROCESS AND RESIST COMPOSITION

PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND MONOMER

PATTERNING PROCESS AND RESIST COMPOSITION

PATTERNING PROCESS AND RESIST COMPOSITION

PATTERNING PROCESS AND RESIST COMPOSITION

SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND MONOMER

SULFONIUM SALT, RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION

PATTERNING PROCESS AND RESIST COMPOSITION