Tomohiro OIKAWA

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Kawasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming pattern
- Patent number 9,529,266
- Issue date Dec 27, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomohiro Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative tone resist composition for solvent developing and method...
- Patent number 9,459,528
- Issue date Oct 4, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomohiro Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,128,374
- Issue date Sep 8, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomohiro Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20190354011
- Publication date Nov 21, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Tomohiro OIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERAT...
- Publication number 20170176855
- Publication date Jun 22, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20150185619
- Publication date Jul 2, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomohiro Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE TONE RESIST COMPOSITION FOR SOLVENT DEVELOPING AND METHOD...
- Publication number 20140363770
- Publication date Dec 11, 2014
- Tomohiro Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20140147790
- Publication date May 29, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomohiro Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY