Tomohiro Sakazaki

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Kasugai, JP

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Patents Grantslast 30 patents

Information Patent Grant
Electron beam lithography apparatus and electron beam lithography m...
- Patent number 8,466,439
- Issue date Jun 18, 2013
- Advantest Corp.
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multicolumn charged-particle beam lithography system
- Patent number 6,344,655
- Issue date Feb 5, 2002
- Advantest Corporation
- Tomohiro Sakazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,242,751
- Issue date Jun 5, 2001
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,969,365
- Issue date Oct 19, 1999
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,757,015
- Issue date May 26, 1998
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Electron beam lithography apparatus and electron beam lithography m...
- Publication number 20110226967
- Publication date Sep 22, 2011
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-column type electron beam exposure apparatus
- Publication number 20080049204
- Publication date Feb 28, 2008
- Hidefumi Yabara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle-beam exposure device and charged-particle-beam exp...
- Publication number 20010013581
- Publication date Aug 16, 2001
- Akio Takemoto
- B82 - NANO-TECHNOLOGY