Tomohiro Suzuki

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method, etching apparatus, and storage medium
- Patent number 9,362,149
- Issue date Jun 7, 2016
- Tokyo Electron Limited
- Yusuke Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annealing apparatus
- Patent number 8,897,631
- Issue date Nov 25, 2014
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annealing device
- Patent number 8,440,939
- Issue date May 14, 2013
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annealing apparatus
- Patent number 8,246,900
- Issue date Aug 21, 2012
- Tokyo Electron Limited
- Shigeru Kasai
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Stage, substrate processing apparatus, plasma processing apparatus,...
- Patent number 8,164,033
- Issue date Apr 24, 2012
- Tokyo Electron Limited
- Chishio Koshimizu
- G01 - MEASURING TESTING
Information Patent Grant
Heating apparatus, heat treatment apparatus, computer program and s...
- Patent number 8,041,197
- Issue date Oct 18, 2011
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, substrate processing apparatus, plasma processing apparatus,...
- Patent number 7,956,310
- Issue date Jun 7, 2011
- Tokyo Electron Limited
- Chishio Koshimizu
- G01 - MEASURING TESTING
Information Patent Grant
Method for measuring physical quantity of measurement object in sub...
- Patent number 7,542,148
- Issue date Jun 2, 2009
- Tokyo Electron Limited
- Chishio Koshimizu
- G01 - MEASURING TESTING
Information Patent Grant
System, apparatus, and method for determining temperature/thickness...
- Patent number 7,446,881
- Issue date Nov 4, 2008
- Tokyo Electron Limited
- Tomohiro Suzuki
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for measuring temperature of substrate
- Patent number 7,416,330
- Issue date Aug 26, 2008
- Tokyo Electron Limited
- Masafumi Ito
- G01 - MEASURING TESTING
Information Patent Grant
Temperature/thickness measuring apparatus, temperature/thickness me...
- Patent number 7,379,189
- Issue date May 27, 2008
- Tokyo Electron Limited
- Tomohiro Suzuki
- G01 - MEASURING TESTING
Information Patent Grant
Temperature measuring apparatus, temperature measurement method, te...
- Patent number 7,355,715
- Issue date Apr 8, 2008
- Tokyo Electron Limited
- Tomohiro Suzuki
- G01 - MEASURING TESTING
Information Patent Grant
Temperature measuring system
- Patent number 6,530,687
- Issue date Mar 11, 2003
- Tokyo Electron Limited
- Tomohiro Suzuki
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Substrate Temperature Regulating Device and Substrate Processing Ap...
- Publication number 20150075748
- Publication date Mar 19, 2015
- TOKYO ELECTRON LIMITED
- Tomohiro SUZUKI
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Etching Method, Etching Apparatus, and Storage Medium
- Publication number 20150072533
- Publication date Mar 12, 2015
- TOKYO ELECTRON LIMITED
- Yusuke MURAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING APPARATUS AND ANNEALING APPARATUS
- Publication number 20120325795
- Publication date Dec 27, 2012
- TOKYO ELECTRON LIMITED
- Tomohiro SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEALING APPARATUS
- Publication number 20120279944
- Publication date Nov 8, 2012
- TOKYO ELECTRON LIMITED
- Shigeru KASAI
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
STAGE, SUBSTRATE PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS,...
- Publication number 20110207245
- Publication date Aug 25, 2011
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- G01 - MEASURING TESTING
Information Patent Application
ANNEALING APPARATUS
- Publication number 20110174790
- Publication date Jul 21, 2011
- TOKYO ELECTRON LIMITED
- Tomohiro Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEALING APPARATUS
- Publication number 20110033175
- Publication date Feb 10, 2011
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEALING APPARATUS
- Publication number 20110024407
- Publication date Feb 3, 2011
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEALING DEVICE
- Publication number 20100314377
- Publication date Dec 16, 2010
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEALING APPARATUS
- Publication number 20100038833
- Publication date Feb 18, 2010
- Tokyo Electron Limited
- Shigeru Kasai
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
APPARATUS FOR MEASURING THICKNESS OF A SUBSTRATE
- Publication number 20090051924
- Publication date Feb 26, 2009
- MASAFUMI ITO
- Masafumi Ito
- G01 - MEASURING TESTING
Information Patent Application
GAS ANALYZING APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20080236747
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- G01 - MEASURING TESTING
Information Patent Application
HEATING APPARATUS, HEAT TREATMENT APPARATUS, COMPUTER PROGRAM AND S...
- Publication number 20080226272
- Publication date Sep 18, 2008
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MEASURING PHYSICAL QUANTITY OF MEASUREMENT OBJECT IN SUB...
- Publication number 20070127034
- Publication date Jun 7, 2007
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- G01 - MEASURING TESTING
Information Patent Application
Stage, substrate processing apparatus, plasma processing apparatus,...
- Publication number 20070084847
- Publication date Apr 19, 2007
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- G01 - MEASURING TESTING
Information Patent Application
Temperature/thickness measuring apparatus, temperature/thickness me...
- Publication number 20060176490
- Publication date Aug 10, 2006
- TOKYO ELECTRON LIMITED
- Tomohiro Suzuki
- G01 - MEASURING TESTING
Information Patent Application
Temperature/thickness measuring apparatus, temperature/thickness me...
- Publication number 20060152734
- Publication date Jul 13, 2006
- TOKYO ELECTRON LIMITED
- Tomohiro Suzuki
- G01 - MEASURING TESTING
Information Patent Application
Temperature measuring apparatus, temperature measurement method, te...
- Publication number 20060077394
- Publication date Apr 13, 2006
- TOKYO ELECTRON LIMITED
- Tomohiro Suzuki
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for measuring temperature of substrate
- Publication number 20050271116
- Publication date Dec 8, 2005
- MASAFUMI ITO
- Masafumi Ito
- G01 - MEASURING TESTING

Tomohiro Suzuki

Person

Patents Grantslast 30 patents

Etching method, etching apparatus, and storage medium

Annealing apparatus

Annealing device

Annealing apparatus

Stage, substrate processing apparatus, plasma processing apparatus,...

Heating apparatus, heat treatment apparatus, computer program and s...

Stage, substrate processing apparatus, plasma processing apparatus,...

Method for measuring physical quantity of measurement object in sub...

System, apparatus, and method for determining temperature/thickness...

Method and apparatus for measuring temperature of substrate

Temperature/thickness measuring apparatus, temperature/thickness me...

Temperature measuring apparatus, temperature measurement method, te...

Temperature measuring system

Patents Applicationslast 30 patents

Substrate Temperature Regulating Device and Substrate Processing Ap...

Etching Method, Etching Apparatus, and Storage Medium

HEATING APPARATUS AND ANNEALING APPARATUS

ANNEALING APPARATUS

STAGE, SUBSTRATE PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS,...

ANNEALING APPARATUS

ANNEALING APPARATUS

ANNEALING APPARATUS

ANNEALING DEVICE

ANNEALING APPARATUS

APPARATUS FOR MEASURING THICKNESS OF A SUBSTRATE

GAS ANALYZING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

HEATING APPARATUS, HEAT TREATMENT APPARATUS, COMPUTER PROGRAM AND S...

METHOD FOR MEASURING PHYSICAL QUANTITY OF MEASUREMENT OBJECT IN SUB...

Stage, substrate processing apparatus, plasma processing apparatus,...

Temperature/thickness measuring apparatus, temperature/thickness me...

Temperature/thickness measuring apparatus, temperature/thickness me...

Temperature measuring apparatus, temperature measurement method, te...

Method and apparatus for measuring temperature of substrate