Tomohisa FUJISAWA

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Pattern-forming method
- Patent number 10,520,815
- Issue date Dec 31, 2019
- JSR Corporation
- Takehiko Naruoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer, and method for form...
- Patent number 8,815,490
- Issue date Aug 26, 2014
- JSR Corporation
- Yasuhiko Matsuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20180017864
- Publication date Jan 18, 2018
- JSR Corporation
- Takehiko NARUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170184960
- Publication date Jun 29, 2017
- JSR Corporation
- Takehiko NARUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORM...
- Publication number 20120094234
- Publication date Apr 19, 2012
- JSR Corporation
- Yasuhiko MATSUDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION...
- Publication number 20110212401
- Publication date Sep 1, 2011
- JSR Corporation
- Yukio NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY