Tomokazu KOZAKAI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing emitter, emitter, and focused ion beam appa...
- Patent number 11,081,312
- Issue date Aug 3, 2021
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for acquiring image and ion beam apparatus
- Patent number 10,276,343
- Issue date Apr 30, 2019
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for acquiring image and ion beam apparatus
- Patent number 10,014,157
- Issue date Jul 3, 2018
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 9,793,085
- Issue date Oct 17, 2017
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and processing method
- Patent number 9,793,092
- Issue date Oct 17, 2017
- Hitachi High-Tech Science Corporation
- Masashi Muramatsu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,773,634
- Issue date Sep 26, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,583,299
- Issue date Feb 28, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repair apparatus
- Patent number 9,378,858
- Issue date Jun 28, 2016
- Hitachi High-Tech Science Corporation
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Focused ion beam apparatus with precious metal emitter surface
- Patent number 9,336,979
- Issue date May 10, 2016
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam system
- Patent number 9,245,712
- Issue date Jan 26, 2016
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating emitter
- Patent number 8,999,178
- Issue date Apr 7, 2015
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen ions from a gas field ion source held at a pressure of 1.0...
- Patent number 8,963,100
- Issue date Feb 24, 2015
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam apparatus and method for forming observation...
- Patent number 8,890,093
- Issue date Nov 18, 2014
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Grant
Method for fabricating emitter
- Patent number 8,764,994
- Issue date Jul 1, 2014
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating EUVL mask
- Patent number 7,927,769
- Issue date Apr 19, 2011
- SII NanoTechnology Inc.
- Ryoji Hagiwara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Working method by focused ion beam and focused ion beam working app...
- Patent number 7,750,318
- Issue date Jul 6, 2010
- SII NanoTechnology Inc.
- Tomokazu Kozakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Focused ion beam processing method
- Patent number 7,576,340
- Issue date Aug 18, 2009
- Sii Nano Technology Inc.
- Ryoji Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam irradiation method and charged particle beam...
- Patent number 7,488,961
- Issue date Feb 10, 2009
- SII NanoTechnology Inc.
- Masashi Muramatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam scan and irradiation method, charged particle...
- Patent number 7,485,880
- Issue date Feb 3, 2009
- SII NanoTechnology Inc.
- Tomokazu Kozakai
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion beam processing method
- Patent number 7,323,685
- Issue date Jan 29, 2008
- SII Nano Technology Inc.
- Kazuo Aita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle processing for forming pattern boundaries at a uni...
- Patent number 6,780,551
- Issue date Aug 24, 2004
- SII NanoTechnology Inc.
- Ryoji Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING EMITTER, EMITTER, AND FOCUSED ION BEAM APPA...
- Publication number 20200312603
- Publication date Oct 1, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK REPAIR APPARATUS AND METHOD FOR REPAIRING MASK
- Publication number 20200310245
- Publication date Oct 1, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS
- Publication number 20180269029
- Publication date Sep 20, 2018
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20170148603
- Publication date May 25, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS
- Publication number 20170092461
- Publication date Mar 30, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20160322123
- Publication date Nov 3, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20160225574
- Publication date Aug 4, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND PROCESSING METHOD
- Publication number 20150206708
- Publication date Jul 23, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Masashi MURAMATSU
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20150162160
- Publication date Jun 11, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20150053866
- Publication date Feb 26, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20150047079
- Publication date Feb 12, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR FORMING OBSERVATION...
- Publication number 20140291509
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- G01 - MEASURING TESTING
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20140284474
- Publication date Sep 25, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING EMITTER
- Publication number 20140246397
- Publication date Sep 4, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING EMITTER
- Publication number 20130248483
- Publication date Sep 26, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20130099133
- Publication date Apr 25, 2013
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating EUVL mask
- Publication number 20090226825
- Publication date Sep 10, 2009
- Ryoji Hagiwara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Working Method by Focused Ion Beam and Focused Ion Beam Working App...
- Publication number 20080302979
- Publication date Dec 11, 2008
- Tomokazu Kozakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Focused ion beam processing method
- Publication number 20070158590
- Publication date Jul 12, 2007
- Ryoji Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged particle beam irradiation method and charged particle beam...
- Publication number 20070114462
- Publication date May 24, 2007
- Masashi Muramatsu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam processing method and charged particle beam a...
- Publication number 20070114460
- Publication date May 24, 2007
- Masashi Muramatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam scan and irradiation method, charged particle...
- Publication number 20070114454
- Publication date May 24, 2007
- Tomokazu Kozakai
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Ion beam processing method
- Publication number 20060097194
- Publication date May 11, 2006
- Kazuo Aita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle processing for forming pattern boundaries at a uni...
- Publication number 20020177055
- Publication date Nov 28, 2002
- Ryoji Hagiwara
- B82 - NANO-TECHNOLOGY

Tomokazu KOZAKAI

Person

Patents Grantslast 30 patents

Method of manufacturing emitter, emitter, and focused ion beam appa...

Method for acquiring image and ion beam apparatus

Method for acquiring image and ion beam apparatus

Focused ion beam apparatus

Charged particle beam apparatus and processing method

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Repair apparatus

Focused ion beam apparatus with precious metal emitter surface

Focused ion beam system

Method for fabricating emitter

Nitrogen ions from a gas field ion source held at a pressure of 1.0...

Charged particle beam apparatus and method for forming observation...

Method for fabricating emitter

Method for fabricating EUVL mask

Working method by focused ion beam and focused ion beam working app...

Focused ion beam processing method

Charged particle beam irradiation method and charged particle beam...

Charged particle beam scan and irradiation method, charged particle...

Ion beam processing method

Charged particle processing for forming pattern boundaries at a uni...

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING EMITTER, EMITTER, AND FOCUSED ION BEAM APPA...

MASK REPAIR APPARATUS AND METHOD FOR REPAIRING MASK

METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS

Repair Apparatus

FOCUSED ION BEAM APPARATUS

CHARGED PARTICLE BEAM APPARATUS AND PROCESSING METHOD

FOCUSED ION BEAM APPARATUS

Repair Apparatus

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR FORMING OBSERVATION...

FOCUSED ION BEAM SYSTEM

METHOD FOR FABRICATING EMITTER

METHOD FOR FABRICATING EMITTER

FOCUSED ION BEAM APPARATUS

Method for fabricating EUVL mask

Working Method by Focused Ion Beam and Focused Ion Beam Working App...

Focused ion beam processing method

Charged particle beam irradiation method and charged particle beam...

Charged particle beam processing method and charged particle beam a...

Charged particle beam scan and irradiation method, charged particle...

Ion beam processing method

Charged particle processing for forming pattern boundaries at a uni...