Tomoki Nagai

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Modification method of substrate surface, and composition and polymer
- Patent number 11,525,067
- Issue date Dec 13, 2022
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern-forming method and patterned substrate
- Patent number 11,462,405
- Issue date Oct 4, 2022
- JSR Corporation
- Hiroyuki Komatsu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Modification method of surface of base, composition, and polymer
- Patent number 11,426,761
- Issue date Aug 30, 2022
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Pattern-forming method, and composition
- Patent number 11,335,559
- Issue date May 17, 2022
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive composition, pattern-forming method and radiati...
- Patent number 11,204,552
- Issue date Dec 21, 2021
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition and pattern-forming method
- Patent number 10,995,173
- Issue date May 4, 2021
- JSR Corporation
- Yuji Namie
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Block copolymer
- Patent number 10,308,752
- Issue date Jun 4, 2019
- JSR Corporation
- Yuji Namie
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Composition for base, and directed self-assembly lithography method
- Patent number 10,146,130
- Issue date Dec 4, 2018
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Chemically amplified resist material and resist pattern-forming method
- Patent number 10,120,282
- Issue date Nov 6, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist-pattern-forming method and chemically amplified resist material
- Patent number 10,073,348
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material, pattern-forming method, compo...
- Patent number 10,073,349
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material and resist pattern-forming method
- Patent number 10,018,911
- Issue date Jul 10, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist material and resist pattern-forming method
- Patent number 9,989,849
- Issue date Jun 5, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,971,247
- Issue date May 15, 2018
- Osaka University
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 9,939,729
- Issue date Apr 10, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, pattern-forming method, and bloc...
- Patent number 9,738,746
- Issue date Aug 22, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Directed self-assembly composition for pattern formation and patter...
- Patent number 9,718,950
- Issue date Aug 1, 2017
- JSR Corporation
- Shinya Minegishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for base, and directed self-assembly lithography method
- Patent number 9,690,192
- Issue date Jun 27, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Directed self-assembling composition for pattern formation, and pat...
- Patent number 9,684,235
- Issue date Jun 20, 2017
- JSR Corporation
- Yuji Namie
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Directed self-assembling composition for pattern formation, and pat...
- Patent number 9,651,861
- Issue date May 16, 2017
- JSR Corporation
- Yuji Namie
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 9,599,892
- Issue date Mar 21, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 9,587,065
- Issue date Mar 7, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Base film-forming composition, and directed self-assembly lithograp...
- Patent number 9,557,644
- Issue date Jan 31, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 9,534,135
- Issue date Jan 3, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,487,868
- Issue date Nov 8, 2016
- JSR Corporation
- Hiroyuki Komatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 9,040,221
- Issue date May 26, 2015
- JSR Corporation
- Hitoshi Osaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for resist underlayer film and process for producing same
- Patent number 8,968,458
- Issue date Mar 3, 2015
- JSR Corporation
- Keiji Konno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for resist underlayer film and process for producing same
- Patent number 8,808,446
- Issue date Aug 19, 2014
- JSR Corporation
- Keiji Konno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,722,306
- Issue date May 13, 2014
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist lower layer film-forming composition, polymer, resist lower...
- Patent number 8,647,810
- Issue date Feb 11, 2014
- JSR Corporation
- Kazuo Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING DEVICE, AND DATA PROCESSING...
- Publication number 20210375403
- Publication date Dec 2, 2021
- JSR Corporation
- Yuya Onishi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODIFICATION METHOD OF SURFACE OF BASE, COMPOSITION, AND POLYMER
- Publication number 20200384499
- Publication date Dec 10, 2020
- JSR Corporation
- Hiroyuki KOMATSU
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION
- Publication number 20200357633
- Publication date Nov 12, 2020
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND PATTERNED SUBSTRATE
- Publication number 20200118819
- Publication date Apr 16, 2020
- JSR Corporation
- Hiroyuki KOMATSU
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
MODIFICATION METHOD OF SUBSTRATE SURFACE, AND COMPOSITION AND POLYMER
- Publication number 20200087530
- Publication date Mar 19, 2020
- JSR Corporation
- Hiroyuki KOMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...
- Publication number 20200041902
- Publication date Feb 6, 2020
- JSR Corporation
- Tomoki NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT SYSTEM AND DIRECTED...
- Publication number 20200013617
- Publication date Jan 9, 2020
- JSR Corporation
- Hiroyuki KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20190241695
- Publication date Aug 8, 2019
- JSR Corporation
- Yuji NAMIE
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION
- Publication number 20180342387
- Publication date Nov 29, 2018
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...
- Publication number 20180267406
- Publication date Sep 20, 2018
- JSR Corporation
- Tomoki NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITI...
- Publication number 20170269476
- Publication date Sep 21, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD
- Publication number 20170248847
- Publication date Aug 31, 2017
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BLOCK COPOLYMER
- Publication number 20170204216
- Publication date Jul 20, 2017
- JSR Corporation
- Yuji NAMIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD
- Publication number 20170131634
- Publication date May 11, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD
- Publication number 20170131633
- Publication date May 11, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...
- Publication number 20170088740
- Publication date Mar 30, 2017
- JSR Corporation
- Hiroyuki KOMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD
- Publication number 20170075221
- Publication date Mar 16, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20170075224
- Publication date Mar 16, 2017
- JSR Corporation
- Hisashi Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SE...
- Publication number 20170059992
- Publication date Mar 2, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170052450
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL
- Publication number 20170052448
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...
- Publication number 20170052449
- Publication date Feb 23, 2017
- Osaka University
- HISASHI NAKAGAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, PATTERN-FORMING METHOD, AND BLOC...
- Publication number 20160293408
- Publication date Oct 6, 2016
- JSR Corporation
- Hiroyuki KOMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150323870
- Publication date Nov 12, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD
- Publication number 20150301445
- Publication date Oct 22, 2015
- JSR Corporation
- Hiroyuki Komatsu
- G02 - OPTICS
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150277223
- Publication date Oct 1, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION
- Publication number 20150252216
- Publication date Sep 10, 2015
- JSR Corporation
- Shinya MINEGISHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150253671
- Publication date Sep 10, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150253663
- Publication date Sep 10, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150225601
- Publication date Aug 13, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Tomoki Nagai

Person

Patents Grantslast 30 patents

Modification method of substrate surface, and composition and polymer

Pattern-forming method and patterned substrate

Modification method of surface of base, composition, and polymer

Pattern-forming method, and composition

Radiation-sensitive composition, pattern-forming method and radiati...

Composition and pattern-forming method

Block copolymer

Composition for base, and directed self-assembly lithography method

Chemically amplified resist material and resist pattern-forming method

Resist-pattern-forming method and chemically amplified resist material

Chemically amplified resist material, pattern-forming method, compo...

Chemically amplified resist material and resist pattern-forming method

Chemically amplified resist material and resist pattern-forming method

Pattern-forming method

Resist pattern-forming method

Composition for pattern formation, pattern-forming method, and bloc...

Directed self-assembly composition for pattern formation and patter...

Composition for base, and directed self-assembly lithography method

Directed self-assembling composition for pattern formation, and pat...

Directed self-assembling composition for pattern formation, and pat...

Composition for pattern formation, and pattern-forming method

Composition for pattern formation, and pattern-forming method

Base film-forming composition, and directed self-assembly lithograp...

Composition for pattern formation, and pattern-forming method

Pattern-forming method

Radiation-sensitive resin composition, method for forming resist pa...

Composition for resist underlayer film and process for producing same

Composition for resist underlayer film and process for producing same

Radiation-sensitive resin composition

Resist lower layer film-forming composition, polymer, resist lower...

Patents Applicationslast 30 patents

DATA PROCESSING METHOD, DATA PROCESSING DEVICE, AND DATA PROCESSING...

MODIFICATION METHOD OF SURFACE OF BASE, COMPOSITION, AND POLYMER

PATTERN-FORMING METHOD, AND COMPOSITION

PATTERN-FORMING METHOD AND PATTERNED SUBSTRATE

MODIFICATION METHOD OF SUBSTRATE SURFACE, AND COMPOSITION AND POLYMER

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...

SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT SYSTEM AND DIRECTED...

COMPOSITION AND PATTERN-FORMING METHOD

PATTERN-FORMING METHOD, AND COMPOSITION

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...

PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITI...

COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD

BLOCK COPOLYMER

CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...

CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SE...

PATTERN-FORMING METHOD

RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL

CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...

COMPOSITION FOR PATTERN FORMATION, PATTERN-FORMING METHOD, AND BLOC...

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD