Tomoki Suemasa

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method of etching dual damascene structure
- Patent number 7,326,650
- Issue date Feb 5, 2008
- Tokyo Electron Limited
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Oxide film etching method
- Publication number 20040173573
- Publication date Sep 9, 2004
- TOKYO ELECTRON LIMITED
- Yoshiki Igarashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching dual damascene structure
- Publication number 20040026364
- Publication date Feb 12, 2004
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and processing method
- Publication number 20030102087
- Publication date Jun 5, 2003
- Youbun Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxide film etching method
- Publication number 20020055263
- Publication date May 9, 2002
- Yoshiki Igarashi
- H01 - BASIC ELECTRIC ELEMENTS