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Tomoko Yasunaga
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Tokyo, JP
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last 30 patents
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Patent Grant
Method of manufacturing semiconductor device having shallow junction
Patent number
6,218,270
Issue date
Apr 17, 2001
NEC Corporation
Tomoko Yasunaga
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Fabrication method of semiconductor device using selective epitaxia...
Patent number
6,190,976
Issue date
Feb 20, 2001
NEC Corporation
Seiichi Shishiguchi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming a MOS field effect transistor with improved gate...
Patent number
6,017,823
Issue date
Jan 25, 2000
NEC Corporation
Seiichi Shishiguchi
H01 - BASIC ELECTRIC ELEMENTS