Tomonari Nakayama

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Chiba, JP

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Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive polyimide resin composition
- Patent number 7,026,080
- Issue date Apr 11, 2006
- Nissan Chemical Industries, Ltd.
- Tomonari Nakayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive polyimide resin composition
- Patent number 6,875,554
- Issue date Apr 5, 2005
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photosensitive polyimide resin composition
- Patent number 6,677,099
- Issue date Jan 13, 2004
- Nissan Chemical Industries, Ltd.
- Kazuhisa Ishii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Positive photosensitive polyimide resin composition
- Publication number 20040197699
- Publication date Oct 7, 2004
- Tomonari Nakayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive photosensitive polyimide resin composition
- Publication number 20040048188
- Publication date Mar 11, 2004
- Tadashi Hatanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY