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Substrate holding apparatus
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Patent number 11,658,058
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Issue date May 23, 2023
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Ebara Corporation
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Takahiro Abe
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H01 - BASIC ELECTRIC ELEMENTS
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Plating apparatus
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Patent number 11,434,580
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Issue date Sep 6, 2022
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Ebara Corporation
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Tomonori Hirao
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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Plating apparatus
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Patent number 11,339,496
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Issue date May 24, 2022
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Ebara Corporation
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Tomonori Hirao
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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Plating apparatus
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Patent number 11,332,838
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Issue date May 17, 2022
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Ebara Corporation
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Gaku Yamasaki
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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Plating apparatus and plating method
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Patent number 11,098,413
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Issue date Aug 24, 2021
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Ebara Corporation
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Shao Hua Chang
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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Substrate holder and plating apparatus
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Patent number 11,015,261
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Issue date May 25, 2021
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Ebara Corporation
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Yoshitaka Mukaiyama
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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Plating apparatus
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Patent number 10,577,706
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Issue date Mar 3, 2020
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Ebara Corporation
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Tomonori Hirao
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Plating apparatus
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Patent number 10,294,576
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Issue date May 21, 2019
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Ebara Corporation
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Tomonori Hirao
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Plating apparatus and plating method
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Patent number 9,388,504
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Issue date Jul 12, 2016
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Ebara Corporation
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Tomonori Hirao
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...