Tomonori Ishikawa

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon-containing composition for fine pattern formation and metho...
- Patent number 8,663,906
- Issue date Mar 4, 2014
- AZ Electronic Materials USA Corp.
- Ralph R Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Superfine-patterned mask, method for production thereof, and method...
- Patent number 8,501,394
- Issue date Aug 6, 2013
- AZ Electronic Materials USA Corp.
- Yusuke Takano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
SUPERFINE-PATTERNED MASK, METHOD FOR PRODUCTION THEREOF, AND METHOD...
- Publication number 20100308015
- Publication date Dec 9, 2010
- Yusuke Takano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING COMPOSITION FOR FINE PATTERN FORMATION AND METHO...
- Publication number 20100255430
- Publication date Oct 7, 2010
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for Producing Siliceous Film and Substrate With The Siliceo...
- Publication number 20090278223
- Publication date Nov 12, 2009
- Tomonori Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Polysilazane-Treating Solvent and Method for Treating Polysilazane...
- Publication number 20080102211
- Publication date May 1, 2008
- Hideki Matsuo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition for forming etching stopper layer
- Publication number 20070026667
- Publication date Feb 1, 2007
- Yuji Tashiro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method of forming trench isolation structure
- Publication number 20060160321
- Publication date Jul 20, 2006
- Masaaki Ichiyama
- H01 - BASIC ELECTRIC ELEMENTS

Tomonori Ishikawa

Person

Patents Grantslast 30 patents

Silicon-containing composition for fine pattern formation and metho...

Superfine-patterned mask, method for production thereof, and method...

Patents Applicationslast 30 patents

SUPERFINE-PATTERNED MASK, METHOD FOR PRODUCTION THEREOF, AND METHOD...

SILICON-CONTAINING COMPOSITION FOR FINE PATTERN FORMATION AND METHO...

Process for Producing Siliceous Film and Substrate With The Siliceo...

Polysilazane-Treating Solvent and Method for Treating Polysilazane...

Composition for forming etching stopper layer

Method of forming trench isolation structure