Tomonori MINEGISHI

Person

Tsukuba-shi, Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resin film, and laminated film including base material film, resin...
- Patent number 11,330,721
- Issue date May 10, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomoaki Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing semiconductor device
- Patent number 11,147,166
- Issue date Oct 12, 2021
- SHOWA DENKO MATERIALS CO., LTD.
- Tomoaki Shibata
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor device and manufacturing method therefor, and resin c...
- Patent number 10,674,612
- Issue date Jun 2, 2020
- Hitachi Chemical Company, Ltd.
- Tomoaki Shibata
- G01 - MEASURING TESTING
Information Patent Grant
Resin composition, wiring layer laminate for semiconductor, and sem...
- Patent number 10,575,402
- Issue date Feb 25, 2020
- Hitachi Chemical Company, Ltd.
- Shinichiro Abe
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive resin composition, film adhesive, adhesive sheet, ad...
- Patent number 10,428,253
- Issue date Oct 1, 2019
- Hitachi Chemical Company, Ltd.
- Tomonori Minegishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive resin composition, method for forming pattern-cured...
- Patent number 9,274,422
- Issue date Mar 1, 2016
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive resin composition, method for producing pat...
- Patent number 9,134,608
- Issue date Sep 15, 2015
- Hitachi Chemical DuPont Microsystems, Ltd.
- Masashi Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-type photosensitive resin composition, pattern forming met...
- Patent number 8,871,422
- Issue date Oct 28, 2014
- Hitachi Chemical DuPont Microsystems Ltd.
- Tomonori Minegishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-type photosensitive resin composition, pattern forming met...
- Patent number 8,758,977
- Issue date Jun 24, 2014
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition and circuit formation substrate us...
- Patent number 8,614,051
- Issue date Dec 24, 2013
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Positive photosensitive resin composition, method for forming patte...
- Patent number 8,420,291
- Issue date Apr 16, 2013
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition and circuit formation substrate us...
- Patent number 8,304,160
- Issue date Nov 6, 2012
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive resin composition, process for producing patterned h...
- Patent number 8,298,747
- Issue date Oct 30, 2012
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR, AND RESIN C...
- Publication number 20200253059
- Publication date Aug 6, 2020
- Hitachi Chemical Company, Ltd.
- Tomoaki SHIBATA
- G01 - MEASURING TESTING
Information Patent Application
RESIN COMPOSITION, WIRING LAYER LAMINATE FOR SEMICONDUCTOR, AND SEM...
- Publication number 20190281697
- Publication date Sep 12, 2019
- Hitachi Chemical Company, Ltd.
- Shinichiro ABE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CURABLE COMPOSITION FOR FORMING ELASTIC RESIN LAYER
- Publication number 20190241694
- Publication date Aug 8, 2019
- HITACHI CHEMICAL COMPANY, LTD.
- Tomoaki SHIBATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR, AND RESIN C...
- Publication number 20180288882
- Publication date Oct 4, 2018
- Tomoaki SHIBATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR, AND RESIN C...
- Publication number 20170325336
- Publication date Nov 9, 2017
- Hitachi Chemical Company, Ltd.
- Tomoaki SHIBATA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, FILM ADHESIVE, ADHESIVE SHEET, AD...
- Publication number 20160160102
- Publication date Jun 9, 2016
- Hitachi Chemical Company, Ltd.
- Tomonori MINEGISHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN-CURED...
- Publication number 20140120462
- Publication date May 1, 2014
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20130143011
- Publication date Jun 6, 2013
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Keiko Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...
- Publication number 20120328856
- Publication date Dec 27, 2012
- HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.
- Tomonori MINEGISHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PAT...
- Publication number 20120288798
- Publication date Nov 15, 2012
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Masashi Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...
- Publication number 20110171436
- Publication date Jul 14, 2011
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tomonori MINEGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...
- Publication number 20100260983
- Publication date Oct 14, 2010
- HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.
- Tomonori MINEGISHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTE...
- Publication number 20100258336
- Publication date Oct 14, 2010
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING...
- Publication number 20100159217
- Publication date Jun 24, 2010
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED H...
- Publication number 20100092879
- Publication date Apr 15, 2010
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...
- Publication number 20090181224
- Publication date Jul 16, 2009
- HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD.
- Tomonori Minegishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tomonori MINEGISHI

Person

Patents Grantslast 30 patents

Resin film, and laminated film including base material film, resin...

Method for producing semiconductor device

Semiconductor device and manufacturing method therefor, and resin c...

Resin composition, wiring layer laminate for semiconductor, and sem...

Photosensitive resin composition, film adhesive, adhesive sheet, ad...

Photosensitive resin composition, method for forming pattern-cured...

Positive photosensitive resin composition, method for producing pat...

Negative-type photosensitive resin composition, pattern forming met...

Negative-type photosensitive resin composition, pattern forming met...

Photosensitive resin composition and circuit formation substrate us...

Positive photosensitive resin composition, method for forming patte...

Photosensitive resin composition and circuit formation substrate us...

Photosensitive resin composition, process for producing patterned h...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR, AND RESIN C...

RESIN COMPOSITION, WIRING LAYER LAMINATE FOR SEMICONDUCTOR, AND SEM...

CURABLE COMPOSITION FOR FORMING ELASTIC RESIN LAYER

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR, AND RESIN C...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR, AND RESIN C...

PHOTOSENSITIVE RESIN COMPOSITION, FILM ADHESIVE, ADHESIVE SHEET, AD...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN-CURED...

PHOTOSENSITIVE RESIN COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PAT...

NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...

PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTE...

NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING...

PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED H...

NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...