Tomotaka Tsuchimura

Person

Shizuoka-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,953,829
- Issue date Apr 9, 2024
- FUJIFILM Corporation
- Kazunari Yagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,656,548
- Issue date May 23, 2023
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,604,412
- Issue date Mar 14, 2023
- FUJIFILM Corporation
- Akihiro Kaneko
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive composition for EUV light, pattern forming method, a...
- Patent number 11,604,414
- Issue date Mar 14, 2023
- FUJIFILM Corporation
- Michihiro Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,467,489
- Issue date Oct 11, 2022
- FUJIFILM Corporation
- Kazunari Yagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 10,802,399
- Issue date Oct 13, 2020
- FUJIFILM Corporation
- Ryo Nishio
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 10,761,424
- Issue date Sep 1, 2020
- FUJIFILM Corporation
- Ryo Nishio
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method and method for manufacturing electronic device
- Patent number 10,394,127
- Issue date Aug 27, 2019
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active light sensitive or radiation sensitive resin composition, ac...
- Patent number 10,324,374
- Issue date Jun 18, 2019
- Fujifilm Corporation
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical amplification resist composition, resist film using the sa...
- Patent number 10,139,727
- Issue date Nov 27, 2018
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,120,281
- Issue date Nov 6, 2018
- FUJIFILM Corporation
- Koutarou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,011,576
- Issue date Jul 3, 2018
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition, resist film using same, pattern formin...
- Patent number 10,007,180
- Issue date Jun 26, 2018
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 9,958,775
- Issue date May 1, 2018
- FUJIFILM Corporation
- Takuya Tsuruta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, active light sensitive or radiation sensitive resin compo...
- Patent number 9,904,167
- Issue date Feb 27, 2018
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation method, active light-sensitive or radiation-sensi...
- Patent number 9,829,796
- Issue date Nov 28, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition, resist film using same, resist-coated mask blank...
- Patent number 9,798,234
- Issue date Oct 24, 2017
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition and pattern forming method using the same
- Patent number 9,718,901
- Issue date Aug 1, 2017
- FUJIFILM Corporation
- Takuya Tsuruta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,632,410
- Issue date Apr 25, 2017
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification resist composition, resist film using the co...
- Patent number 9,625,813
- Issue date Apr 18, 2017
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,563,121
- Issue date Feb 7, 2017
- FUJIFILM Corporation
- Takeshi Inasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,557,643
- Issue date Jan 31, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition, photocurable composition, chemical ampl...
- Patent number 9,488,911
- Issue date Nov 8, 2016
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,400,430
- Issue date Jul 26, 2016
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, and resis...
- Patent number 9,285,679
- Issue date Mar 15, 2016
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative actinic ray-sensitive or radiation-sensitive resin composi...
- Patent number 9,235,120
- Issue date Jan 12, 2016
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation sensitive resin composition, actinic-ray-...
- Patent number 9,235,116
- Issue date Jan 12, 2016
- FUJIFILM Corporation
- Takeshi Inasaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,223,204
- Issue date Dec 29, 2015
- FUJITSU Corporation
- Takayuki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,223,208
- Issue date Dec 29, 2015
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition, pattern-forming method using the compos...
- Patent number 9,217,919
- Issue date Dec 22, 2015
- FUJIFILM Corporation
- Hidenori Takahashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240201589
- Publication date Jun 20, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240192592
- Publication date Jun 13, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200319551
- Publication date Oct 8, 2020
- FUJIFILM CORPORATION
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200201177
- Publication date Jun 25, 2020
- FUJIFILM CORPORATION
- Kazunari YAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200192220
- Publication date Jun 18, 2020
- FUJIFILM CORPORATION
- Kazunari YAGI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200183280
- Publication date Jun 11, 2020
- FUJIFILM CORPORATION
- Michihiro OGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200124963
- Publication date Apr 23, 2020
- FUJIFILM CORPORATION
- Akihiro KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...
- Publication number 20200050106
- Publication date Feb 13, 2020
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20180364571
- Publication date Dec 20, 2018
- FUJIFILM CORPORATION
- Ryo NISHIO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180321589
- Publication date Nov 8, 2018
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180267404
- Publication date Sep 20, 2018
- FUJIFILM CORPORATION
- Akihiro KANEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180017872
- Publication date Jan 18, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20170121437
- Publication date May 4, 2017
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE OR ACTINIC RAY-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20170059990
- Publication date Mar 2, 2017
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MANUFACTURING METHOD FOR ACTINIC RAY-SENSITIVE OR RADIATION-SENSITI...
- Publication number 20170003591
- Publication date Jan 5, 2017
- FUJIFILM CORPORATION
- Hidehiro MOCHIZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION
- Publication number 20170005266
- Publication date Jan 5, 2017
- FUJIFILM CORPORATION
- Yuzo NAGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20160342090
- Publication date Nov 24, 2016
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK...
- Publication number 20160327862
- Publication date Nov 10, 2016
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160282720
- Publication date Sep 29, 2016
- FUJIFILM CORPORATION
- Koutarou TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160280675
- Publication date Sep 29, 2016
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...
- Publication number 20160209746
- Publication date Jul 21, 2016
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...
- Publication number 20160147155
- Publication date May 26, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST...
- Publication number 20160131976
- Publication date May 12, 2016
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPO...
- Publication number 20160116840
- Publication date Apr 28, 2016
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20160018732
- Publication date Jan 21, 2016
- FUJIFILM CORPORATION
- SHUHEI YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPL...
- Publication number 20150362836
- Publication date Dec 17, 2015
- FUJIFILM CORPORATION
- TOMOTAKA TSUCHIMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE RESIST COMPOSITION, RESIST FILM USING SAME, PATTERN FORMIN...
- Publication number 20150309408
- Publication date Oct 29, 2015
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20150118623
- Publication date Apr 30, 2015
- FUJIFILM CORPORATION
- Takuya TSURUTA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20150086911
- Publication date Mar 26, 2015
- FUJIFILM CORPORATION
- Takuya TSURUTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE SA...
- Publication number 20150072274
- Publication date Mar 12, 2015
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tomotaka Tsuchimura

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Photosensitive composition for EUV light, pattern forming method, a...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Pattern forming method and method for manufacturing electronic device

Active light sensitive or radiation sensitive resin composition, ac...

Chemical amplification resist composition, resist film using the sa...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Negative resist composition, resist film using same, pattern formin...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Compound, active light sensitive or radiation sensitive resin compo...

Pattern formation method, active light-sensitive or radiation-sensi...

Resin composition, resist film using same, resist-coated mask blank...

Resin composition and pattern forming method using the same

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Chemical amplification resist composition, resist film using the co...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Photosensitive composition, photocurable composition, chemical ampl...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive composition, and resis...

Negative actinic ray-sensitive or radiation-sensitive resin composi...

Actinic-ray- or radiation sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic-ray- or radiation-sensitive resin composition and method of...

Photosensitive composition, pattern-forming method using the compos...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

RADIATION-SENSITIVE OR ACTINIC RAY-SENSITIVE RESIN COMPOSITION, RES...

MANUFACTURING METHOD FOR ACTINIC RAY-SENSITIVE OR RADIATION-SENSITI...

SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...

PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...

RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST...

COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPL...

NEGATIVE RESIST COMPOSITION, RESIST FILM USING SAME, PATTERN FORMIN...

RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE SA...