Tomotaka Yamada

Person

Atsugi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 10,261,416
- Issue date Apr 16, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Tomotaka Yamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, and polymeric...
- Patent number 9,170,487
- Issue date Oct 27, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yusuke Suzuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming resist pattern by nanoimprint lithography
- Patent number 8,828,304
- Issue date Sep 9, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive resin composition and method of forming pattern
- Patent number 8,216,763
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 8,198,004
- Issue date Jun 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,541,138
- Issue date Jun 2, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,527,909
- Issue date May 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,501,220
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 7,416,832
- Issue date Aug 26, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lift-off positive resist composition
- Patent number 7,318,992
- Issue date Jan 15, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 7,261,994
- Issue date Aug 28, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Takayuki Hosono
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,818,380
- Issue date Nov 16, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,777,158
- Issue date Aug 17, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Crosslinked positive-working photoresist composition
- Patent number 6,630,282
- Issue date Oct 7, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,485,887
- Issue date Nov 26, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,340,553
- Issue date Jan 22, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20240118619
- Publication date Apr 11, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20230314945
- Publication date Oct 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20180067394
- Publication date Mar 8, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tomotaka YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...
- Publication number 20130260312
- Publication date Oct 3, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yusuke Suzuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN
- Publication number 20090220889
- Publication date Sep 3, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN BY NANOIMPRINT LITHOGRAPHY
- Publication number 20090189317
- Publication date Jul 30, 2009
- TOKYO OHKA KOGYO CO., LTD.
- Kazufumi Sato
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESIST COMPOSITION
- Publication number 20090130605
- Publication date May 21, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILSESQUIOXANE RESIN, POSITIVE RESIST COMPOSITION, RESIST LAMINATE,...
- Publication number 20090068586
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming antireflection coating
- Publication number 20070281098
- Publication date Dec 6, 2007
- Taku Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION
- Publication number 20070190436
- Publication date Aug 16, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20070178394
- Publication date Aug 2, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition, resist laminates and process for formi...
- Publication number 20070009828
- Publication date Jan 11, 2007
- Tokyo Ohka Kogyo, Co., LTD.
- Koki Tamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silsesquioxane resin, positive resist composition,layered product i...
- Publication number 20060222866
- Publication date Oct 5, 2006
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming antireflection coating
- Publication number 20060021964
- Publication date Feb 2, 2006
- Taku Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical amplification type silicone based positive photoresist com...
- Publication number 20060003252
- Publication date Jan 5, 2006
- Taku Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming antireflection coating
- Publication number 20050282090
- Publication date Dec 22, 2005
- Kawasaki-shi Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Lift-off positive resist composition
- Publication number 20050227171
- Publication date Oct 13, 2005
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20050227170
- Publication date Oct 13, 2005
- Takayuki Hosono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20050221225
- Publication date Oct 6, 2005
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20050014090
- Publication date Jan 20, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the preparation of a semiconductor device
- Publication number 20040067615
- Publication date Apr 8, 2004
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the preparation of a semiconductor device
- Publication number 20020045133
- Publication date Apr 18, 2002
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Crosslinked positive-working photoresist composition
- Publication number 20020034704
- Publication date Mar 21, 2002
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoresist composition
- Publication number 20020031722
- Publication date Mar 14, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Tomotaka Yamada

Person

Patents Grantslast 30 patents

Resist composition and method for forming resist pattern

Resist composition, method of forming resist pattern, and polymeric...

Method of forming resist pattern by nanoimprint lithography

Photosensitive resin composition and method of forming pattern

Resist composition

Resist composition

Resist composition

Resist composition

Positive resist composition

Lift-off positive resist composition

Positive resist composition

Method for the preparation of a semiconductor device

Method for the preparation of a semiconductor device

Crosslinked positive-working photoresist composition

Positive-working photoresist composition

Positive-working photoresist composition

Patents Applicationslast 30 patents

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...

PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN

METHOD OF FORMING RESIST PATTERN BY NANOIMPRINT LITHOGRAPHY

RESIST COMPOSITION

SILSESQUIOXANE RESIN, POSITIVE RESIST COMPOSITION, RESIST LAMINATE,...

Composition for forming antireflection coating

RESIST COMPOSITION

RESIST COMPOSITION

Positive resist composition, resist laminates and process for formi...

Silsesquioxane resin, positive resist composition,layered product i...

Composition for forming antireflection coating

Chemical amplification type silicone based positive photoresist com...

Composition for forming antireflection coating

Lift-off positive resist composition

Positive resist composition

Positive resist composition

Resist composition

Method for the preparation of a semiconductor device

Method for the preparation of a semiconductor device

Crosslinked positive-working photoresist composition

Positive-working photoresist composition