Tomotaka Yamanaka

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Chiba, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin, and photosensitive composition
- Patent number 7,858,287
- Issue date Dec 28, 2010
- Hyogo Prefecture
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing 1,2-naphthoquinonediazide photosensitive agent
- Patent number 6,448,383
- Issue date Sep 10, 2002
- Toyo Gosei Kogyo Co., Ltd.
- Tomotaka Yamanaka
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION
- Publication number 20090142697
- Publication date Jun 4, 2009
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing 1,2-naphthoquinonediazide photosensitive agent
- Publication number 20010049433
- Publication date Dec 6, 2001
- Tomotaka Yamanaka
- C07 - ORGANIC CHEMISTRY