Tomoya Kumagai

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning liquid, and method of cleaning substrate provided with met...
- Patent number 11,131,932
- Issue date Sep 28, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning liquid, and method of cleaning substrate provided with met...
- Patent number 11,131,933
- Issue date Sep 28, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning liquid, and method of cleaning substrate provided with met...
- Patent number 11,119,410
- Issue date Sep 14, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming method and developer for lithography
- Patent number 9,964,851
- Issue date May 8, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid for lithography and method for forming wiring
- Patent number 9,920,286
- Issue date Mar 20, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- B08 - CLEANING
Information Patent Grant
Cleaning liquid for lithography and method for cleaning substrate
- Patent number 9,796,953
- Issue date Oct 24, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating agent for forming fine pattern
- Patent number 9,417,532
- Issue date Aug 16, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takumi Namiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing solution for photolithography, method for forming resist...
- Patent number 9,291,905
- Issue date Mar 22, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Coating agent for forming fine pattern
- Patent number 9,063,430
- Issue date Jun 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cleaning liquid and anticorrosive agent comprising a mercapto compo...
- Patent number 8,802,610
- Issue date Aug 12, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Detergent for lithography and method of forming resist pattern with...
- Patent number 8,367,312
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist surface modifying liquid, and method for formation of resist...
- Patent number 8,349,549
- Issue date Jan 8, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CLEANING LIQUID USED FOR CLEANING METAL RESISTS, AND CLEANING METHO...
- Publication number 20230183617
- Publication date Jun 15, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Mai SUGAWARA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING LIQUID USED FOR CLEANING METAL RESISTS, AND CLEANING METHO...
- Publication number 20230183866
- Publication date Jun 15, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Mai SUGAWARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THINNER COMPOSITION AND METHOD OF PROCESSING SURFACES OF SEMICONDUC...
- Publication number 20220243149
- Publication date Aug 4, 2022
- SK HYNIX INC.
- Kyung Hee OH
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING LIQUID, AND METHOD OF CLEANING SUBSTRATE PROVIDED WITH MET...
- Publication number 20200326630
- Publication date Oct 15, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING LIQUID, AND METHOD OF CLEANING SUBSTRATE PROVIDED WITH MET...
- Publication number 20200326631
- Publication date Oct 15, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING LIQUID, AND METHOD OF CLEANING SUBSTRATE PROVIDED WITH MET...
- Publication number 20200326629
- Publication date Oct 15, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY
- Publication number 20170059994
- Publication date Mar 2, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING
- Publication number 20160208201
- Publication date Jul 21, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya KUMAGAI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR CLEANING SUBSTRATE
- Publication number 20160122695
- Publication date May 5, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya KUMAGAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING AGENT FOR FORMING FINE PATTERN
- Publication number 20150277228
- Publication date Oct 1, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takumi Namiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING SOLUTION FOR PHOTOLITHOGRAPHY, METHOD FOR FORMING RESIST...
- Publication number 20150160560
- Publication date Jun 11, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING AGENT FOR FORMING FINE PATTERN
- Publication number 20150017590
- Publication date Jan 15, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CLEANING LIQUID AND ANTICORROSIVE AGENT
- Publication number 20140018281
- Publication date Jan 16, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING
- Publication number 20130330927
- Publication date Dec 12, 2013
- Tomoya Kumagai
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING LIQUID, AND ANTICORROSIVE AGENT
- Publication number 20130172224
- Publication date Jul 4, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVELOPING SOLUTION FOR PHOTOLITHOGRAPHY, METHOD FOR FORMING RESIST...
- Publication number 20110159447
- Publication date Jun 30, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya KUMAGAI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING A RESIST PAT...
- Publication number 20100248164
- Publication date Sep 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya KUMAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist surface modifying liquid, and method for formation of resist...
- Publication number 20100129758
- Publication date May 27, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Detergent For Lithography And Method Of Forming Resist Pattern With...
- Publication number 20090004608
- Publication date Jan 1, 2009
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tomoya Kumagai

Person

Patents Grantslast 30 patents

Cleaning liquid, and method of cleaning substrate provided with met...

Cleaning liquid, and method of cleaning substrate provided with met...

Cleaning liquid, and method of cleaning substrate provided with met...

Resist pattern forming method and developer for lithography

Cleaning liquid for lithography and method for forming wiring

Cleaning liquid for lithography and method for cleaning substrate

Coating agent for forming fine pattern

Developing solution for photolithography, method for forming resist...

Coating agent for forming fine pattern

Cleaning liquid and anticorrosive agent comprising a mercapto compo...

Detergent for lithography and method of forming resist pattern with...

Resist surface modifying liquid, and method for formation of resist...

Patents Applicationslast 30 patents

CLEANING LIQUID USED FOR CLEANING METAL RESISTS, AND CLEANING METHO...

CLEANING LIQUID USED FOR CLEANING METAL RESISTS, AND CLEANING METHO...

THINNER COMPOSITION AND METHOD OF PROCESSING SURFACES OF SEMICONDUC...

CLEANING LIQUID, AND METHOD OF CLEANING SUBSTRATE PROVIDED WITH MET...

CLEANING LIQUID, AND METHOD OF CLEANING SUBSTRATE PROVIDED WITH MET...

CLEANING LIQUID, AND METHOD OF CLEANING SUBSTRATE PROVIDED WITH MET...

RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY

CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING

CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR CLEANING SUBSTRATE

COATING AGENT FOR FORMING FINE PATTERN

DEVELOPING SOLUTION FOR PHOTOLITHOGRAPHY, METHOD FOR FORMING RESIST...

COATING AGENT FOR FORMING FINE PATTERN

CLEANING LIQUID AND ANTICORROSIVE AGENT

CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING

CLEANING LIQUID, AND ANTICORROSIVE AGENT

DEVELOPING SOLUTION FOR PHOTOLITHOGRAPHY, METHOD FOR FORMING RESIST...

CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING A RESIST PAT...

Resist surface modifying liquid, and method for formation of resist...

Detergent For Lithography And Method Of Forming Resist Pattern With...