Tomoya Okubo

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,985,029
- Issue date Apr 20, 2021
- Tokyo Electron Limited
- Hiroyuki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,541,145
- Issue date Jan 21, 2020
- Tokyo Electron Limited
- Hiroyuki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, focus ring, and susceptor
- Patent number 8,124,539
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Shosuke Endoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of resetting substrate processing apparatus, storage medium...
- Patent number 7,231,321
- Issue date Jun 12, 2007
- Tokyo Electron Limited
- Hajime Furuya
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200118830
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Hiroyuki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180286696
- Publication date Oct 4, 2018
- Hiroyuki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF FORMING...
- Publication number 20120186985
- Publication date Jul 26, 2012
- TOKYO ELECTRON LIMITED
- Kouji Mitsuhashi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE HEATING APPARATUS, SUBSTRATE HEATING METHOD AND SUBSTRATE...
- Publication number 20110183279
- Publication date Jul 28, 2011
- TOKYO ELECTRON LIMITED
- Tomoya OKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, FOCUS RING, AND SUSCEPTOR
- Publication number 20110000883
- Publication date Jan 6, 2011
- TOKYO ELECTRON LIMITED
- Shosuke Endoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF FORMING...
- Publication number 20080105203
- Publication date May 8, 2008
- TOKYO ELECTRON LIMITED
- Kouji Mitsuhashi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method of resetting substrate processing apparatus, storage medium...
- Publication number 20060100825
- Publication date May 11, 2006
- TOKYO ELECTRON LIMITED
- Hajime Furuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, focus ring, and susceptor
- Publication number 20040261946
- Publication date Dec 30, 2004
- TOKYO ELECTRON LIMITED
- Shosuke Endoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus
- Publication number 20040149214
- Publication date Aug 5, 2004
- TOKYO ELECTRON LIMITED
- Jun Hirose
- H01 - BASIC ELECTRIC ELEMENTS

Tomoya Okubo

Person

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Plasma processing apparatus, focus ring, and susceptor

Method of resetting substrate processing apparatus, storage medium...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

COMPONENT FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF FORMING...

SUBSTRATE HEATING APPARATUS, SUBSTRATE HEATING METHOD AND SUBSTRATE...

PLASMA PROCESSING APPARATUS, FOCUS RING, AND SUSCEPTOR

COMPONENT FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF FORMING...

Method of resetting substrate processing apparatus, storage medium...

Plasma processing apparatus, focus ring, and susceptor

Vacuum processing apparatus