Tomoyasu HASEGAWA

Person

Chiyoda-ku, Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Slurry and polishing method
- Patent number 12,173,219
- Issue date Dec 24, 2024
- Resonac Corporation
- Satoyuki Nomura
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Slurry, screening method, and polishing method
- Patent number 12,104,112
- Issue date Oct 1, 2024
- Resonac Corporation
- Satoyuki Nomura
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,814,548
- Issue date Nov 14, 2023
- Resonac Corporation
- Tomohiro Iwano
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,773,291
- Issue date Oct 3, 2023
- Resonac Corporation
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,767,448
- Issue date Sep 26, 2023
- Resonac Corporation
- Takaaki Matsumoto
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry and polishing method
- Patent number 11,702,569
- Issue date Jul 18, 2023
- Resonac Corporation
- Takaaki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry, and polishing method
- Patent number 11,518,920
- Issue date Dec 6, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomoyasu Hasegawa
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Slurry and polishing method
- Patent number 11,505,731
- Issue date Nov 22, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Takaaki Matsumoto
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, polishing solution production method, and polishing method
- Patent number 11,499,078
- Issue date Nov 15, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomomi Kukita
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, method for producing polishing liquid, and polishing method
- Patent number 11,492,526
- Issue date Nov 8, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomoyasu Hasegawa
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, polishing solution production method, and polishing method
- Patent number 11,359,121
- Issue date Jun 14, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomomi Kukita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid, polishing liquid set and polishing method
- Patent number 11,352,523
- Issue date Jun 7, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing liquid, polishing liquid set and polishing method
- Patent number 11,292,939
- Issue date Apr 5, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomohiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,198,796
- Issue date Dec 14, 2021
- SHOWA DENKO MATERIALS CO., LTD.
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
SLURRY, SCREENING METHOD, AND POLISHING METHOD
- Publication number 20240425737
- Publication date Dec 26, 2024
- Resonac Corporation
- Satoyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD
- Publication number 20230203342
- Publication date Jun 29, 2023
- Tomomi KUKITA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY AND POLISHING METHOD
- Publication number 20220033680
- Publication date Feb 3, 2022
- Showa Denko Materials Co., Ltd.
- Tomohiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD
- Publication number 20220017783
- Publication date Jan 20, 2022
- Showa Denko Materials Co., Ltd.
- Tomohiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY, AND POLISHING METHOD
- Publication number 20210324237
- Publication date Oct 21, 2021
- Showa Denko Materials Co., Ltd.
- Tomoyasu HASEGAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, SCREENING METHOD, AND POLISHING METHOD
- Publication number 20210309884
- Publication date Oct 7, 2021
- Showa Denko Materials Co., Ltd.
- Satoyuki NOMURA
- B24 - GRINDING POLISHING
Information Patent Application
SLURRY AND POLISHING METHOD
- Publication number 20210301179
- Publication date Sep 30, 2021
- Showa Denko Materials Co., Ltd.
- Satoyuki NOMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING SOLUTION PRODUCTION METHOD, AND POLISHING METHOD
- Publication number 20210261820
- Publication date Aug 26, 2021
- Showa Denko Materials Co., Ltd.
- Tomomi KUKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY, METHOD FOR PRODUCING POLISHING LIQUID, AND POLISHING METHOD
- Publication number 20210246346
- Publication date Aug 12, 2021
- Showa Denko Materials Co., Ltd.
- Tomoyasu HASEGAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, SLURRY SET AND POLISHING METHOD
- Publication number 20210071037
- Publication date Mar 11, 2021
- Tomohiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD
- Publication number 20210054233
- Publication date Feb 25, 2021
- Hitachi Chemical Company, Ltd.
- Takaaki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY AND POLISHING METHOD
- Publication number 20200299545
- Publication date Sep 24, 2020
- Hitachi Chemical Company, Ltd.
- Takaaki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD
- Publication number 20200032106
- Publication date Jan 30, 2020
- Hitachi Chemical Company, Ltd.
- Tomohiro IWANO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Tomoyasu HASEGAWA

Person

Patents Grantslast 30 patents

Slurry and polishing method

Slurry, screening method, and polishing method

Polishing liquid, polishing liquid set, and polishing method

Polishing liquid, polishing liquid set, and polishing method

Polishing liquid, polishing liquid set, and polishing method

Slurry and polishing method

Slurry, and polishing method

Slurry and polishing method

Slurry, polishing solution production method, and polishing method

Slurry, method for producing polishing liquid, and polishing method

Slurry, polishing solution production method, and polishing method

Polishing liquid, polishing liquid set and polishing method

Polishing liquid, polishing liquid set and polishing method

Polishing liquid, polishing liquid set, and polishing method

Patents Applicationslast 30 patents

SLURRY, SCREENING METHOD, AND POLISHING METHOD

POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD

SLURRY AND POLISHING METHOD

POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD

SLURRY, AND POLISHING METHOD

SLURRY, SCREENING METHOD, AND POLISHING METHOD

SLURRY AND POLISHING METHOD

SLURRY, POLISHING SOLUTION PRODUCTION METHOD, AND POLISHING METHOD

SLURRY, METHOD FOR PRODUCING POLISHING LIQUID, AND POLISHING METHOD

SLURRY, SLURRY SET AND POLISHING METHOD

POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD

SLURRY AND POLISHING METHOD

POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD