TREA

Tomoyasu Kondo

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Patents Grantslast 30 patents

  • Information Patent Grant

    Method for forming tantalum nitride film
    • Patent number 8,796,142
    • Issue date Aug 5, 2014
    • ULVAC, Inc.
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Cathode unit and sputtering apparatus provided with the same
    • Patent number 8,470,145
    • Issue date Jun 25, 2013
    • ULVAC, Inc.
    • Naoki Morimoto
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Sputtering apparatus
    • Patent number 8,377,269
    • Issue date Feb 19, 2013
    • ULVAC, Inc.
    • Naoki Morimoto
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method for forming tantalum nitride film
    • Patent number 8,158,198
    • Issue date Apr 17, 2012
    • ULVAC, Inc.
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method for forming tantalum nitride film
    • Patent number 8,158,197
    • Issue date Apr 17, 2012
    • ULVAC, Inc.
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method for forming tantalum nitride film
    • Patent number 8,105,468
    • Issue date Jan 31, 2012
    • ULVAC, Inc.
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Sputtering apparatus and film manufacturing method
    • Patent number 6,706,155
    • Issue date Mar 16, 2004
    • Qlvac, Inc.
    • Naoki Morimoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Inductively coupled RF plasma source
    • Patent number 6,469,448
    • Issue date Oct 22, 2002
    • Nihon Shinku Gijutsu Kabushiki Kaisha
    • Youji Taguchi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Sputtering device
    • Patent number 6,413,392
    • Issue date Jul 2, 2002
    • Nihon Shinku Gijutsu Kabushiki Kaisha
    • Tsuyoshi Sahoda
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Sputtering device
    • Patent number 6,217,730
    • Issue date Apr 17, 2001
    • Nihon Shinku Gijutsu Kabushiki Kaisha
    • Kuniaki Nakajima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

  • Information Patent Application

    SPUTTERING APPARATUS
    • Publication number 20180057928
    • Publication date Mar 1, 2018
    • Ulvac, Inc.
    • Hiroki Yamamoto
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SPUTTERING APPARATUS
    • Publication number 20110062019
    • Publication date Mar 17, 2011
    • Naoki Morimoto
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    CATHODE UNIT AND SPUTTERING APPARATUS PROVIDED WITH THE SAME
    • Publication number 20110056829
    • Publication date Mar 10, 2011
    • Naoki Morimoto
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SPUTTERING APPARATUS AND SPUTTERING METHOD
    • Publication number 20110048927
    • Publication date Mar 3, 2011
    • Naoki Morimoto
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Method for Forming Tantalum Nitride Film
    • Publication number 20100206716
    • Publication date Aug 19, 2010
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    METHOD FOR FORMING TANTALUM NITRIDE FILM
    • Publication number 20090246375
    • Publication date Oct 1, 2009
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Method for Forming Tantalum Nitride Film
    • Publication number 20090159430
    • Publication date Jun 25, 2009
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Method for Forming Tantalum Nitride Film
    • Publication number 20090162565
    • Publication date Jun 25, 2009
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Method for Forming Tantalum Nitride Film
    • Publication number 20090159431
    • Publication date Jun 25, 2009
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Method for Forming Tantalum Nitride Film
    • Publication number 20090104775
    • Publication date Apr 23, 2009
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Method for Forming Tantalum Nitride Film
    • Publication number 20080199601
    • Publication date Aug 21, 2008
    • Narishi Gonohe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Inductively coupled RF plasma source
    • Publication number 20020096999
    • Publication date Jul 25, 2002
    • Youji Taguchi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Sputtering apparatus and film manufacturing method
    • Publication number 20020029960
    • Publication date Mar 14, 2002
    • Naoki Morimoto
    • H01 - BASIC ELECTRIC ELEMENTS