Tomoyuki Ando

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate bonding method and laminated body production method
- Patent number 11,491,772
- Issue date Nov 8, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Ryuma Mizusawa
- B32 - LAYERED PRODUCTS
Information Patent Grant
Negative type photosensitive resin composition, photosensitive resi...
- Patent number 11,415,888
- Issue date Aug 16, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Ryosuke Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative photosensitive composition and pattern formation method
- Patent number 10,241,403
- Issue date Mar 26, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Hirofumi Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing thick film photoresist pattern
- Patent number 9,244,354
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Washio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Norbornene-type polymers, compositions thereof and lithographic pro...
- Patent number 8,329,838
- Issue date Dec 11, 2012
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming resist pattern
- Patent number 8,263,322
- Issue date Sep 11, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 8,236,483
- Issue date Aug 7, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and resist pattern forming method
- Patent number 8,062,825
- Issue date Nov 22, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Norbornene-type polymers, compositions thereof and lithographic pro...
- Patent number 7,799,883
- Issue date Sep 21, 2010
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition
- Patent number 7,749,677
- Issue date Jul 6, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,727,701
- Issue date Jun 1, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takuma Hojo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and resist pattern forming method
- Patent number 7,687,221
- Issue date Mar 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Taako Hirosaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Lift-off positive resist composition
- Patent number 7,318,992
- Issue date Jan 15, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE BONDING METHOD AND LAMINATED BODY PRODUCTION METHOD
- Publication number 20210283893
- Publication date Sep 16, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Ryuma MIZUSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESI...
- Publication number 20190235380
- Publication date Aug 1, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Ryosuke NAKAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20180095366
- Publication date Apr 5, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Hirofumi IMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING THICK FILM PHOTORESIST PATTERN
- Publication number 20130171572
- Publication date Jul 4, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Washio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THIC...
- Publication number 20120141940
- Publication date Jun 7, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Norbornene-Type Polymers, Compositions Thereof And Lithographic Pro...
- Publication number 20110065878
- Publication date Mar 17, 2011
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20100167217
- Publication date Jul 1, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20100035192
- Publication date Feb 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20090075177
- Publication date Mar 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20090047600
- Publication date Feb 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Hirosaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive Resist Composition and Method of Forming Resist Pattern
- Publication number 20080241747
- Publication date Oct 2, 2008
- TOKYO OHKA KOGYO CO., LTD.
- Takuma Hojo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative Resist Composition
- Publication number 20080241753
- Publication date Oct 2, 2008
- Tomoyuki Ando
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition, resist laminates and process for formi...
- Publication number 20070009828
- Publication date Jan 11, 2007
- Tokyo Ohka Kogyo, Co., LTD.
- Koki Tamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Norbornene-type polymers, compositions thereof and lithographic pro...
- Publication number 20060234164
- Publication date Oct 19, 2006
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Norbornene-type polymers, compositions thereof and lithographic pro...
- Publication number 20060235174
- Publication date Oct 19, 2006
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Lift-off positive resist composition
- Publication number 20050227171
- Publication date Oct 13, 2005
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tomoyuki Ando

Person

Patents Grantslast 30 patents

Substrate bonding method and laminated body production method

Negative type photosensitive resin composition, photosensitive resi...

Negative photosensitive composition and pattern formation method

Method for producing thick film photoresist pattern

Norbornene-type polymers, compositions thereof and lithographic pro...

Method of forming resist pattern

Method of forming resist pattern

Positive resist composition and resist pattern forming method

Norbornene-type polymers, compositions thereof and lithographic pro...

Negative resist composition

Positive resist composition and method of forming resist pattern

Positive resist composition and resist pattern forming method

Lift-off positive resist composition

Patents Applicationslast 30 patents

SUBSTRATE BONDING METHOD AND LAMINATED BODY PRODUCTION METHOD

NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESI...

NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD

METHOD FOR PRODUCING THICK FILM PHOTORESIST PATTERN

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THIC...

Norbornene-Type Polymers, Compositions Thereof And Lithographic Pro...

METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

Positive Resist Composition and Method of Forming Resist Pattern

Negative Resist Composition

Positive resist composition, resist laminates and process for formi...

Norbornene-type polymers, compositions thereof and lithographic pro...

Norbornene-type polymers, compositions thereof and lithographic pro...

Lift-off positive resist composition