Tomoyuki Imada

Person

Ichihara-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist material
- Patent number 11,487,204
- Issue date Nov 1, 2022
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Calixarene compound, curable composition, and cured product
- Patent number 11,472,763
- Issue date Oct 18, 2022
- DIC Corporation
- Shinya Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Novolak resins and resist materials
- Patent number 11,254,778
- Issue date Feb 22, 2022
- DIC Corporation
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Calixarene compound and curable composition
- Patent number 11,111,225
- Issue date Sep 7, 2021
- DIC Corporation
- Shinya Yamamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Phenolic-hydroxyl-group-containing novolac resin and resist film
- Patent number 10,577,449
- Issue date Mar 3, 2020
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Naphthol-type calixarene compound and method for producing the same...
- Patent number 10,466,590
- Issue date Nov 5, 2019
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin containing phenolic hydroxyl groups, and resist film
- Patent number 10,414,850
- Issue date Sep 17, 2019
- DIC Corporation
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Phenolic hydroxyl-containing compound, composition containing the s...
- Patent number 10,266,471
- Issue date Apr 23, 2019
- DIC Corporation
- Tomoyuki Imada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Curable composition for permanent resist films, and permanent resis...
- Patent number 10,179,828
- Issue date Jan 15, 2019
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Novolac phenol resin, manufacturing method therefor, photosensitive...
- Patent number 10,047,186
- Issue date Aug 14, 2018
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novolac-type phenolic hydroxyl group-containing resin, production m...
- Patent number 10,047,185
- Issue date Aug 14, 2018
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound containing modified phenolic hydroxy group, method for pro...
- Patent number 9,975,830
- Issue date May 22, 2018
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phenolic hydroxyl group-containing resin, production method therefo...
- Patent number 9,963,536
- Issue date May 8, 2018
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound containing phenolic hydroxy group, photosensitive composit...
- Patent number 9,828,457
- Issue date Nov 28, 2017
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modified hydroxy naphthalene novolak resin, production method for m...
- Patent number 9,765,175
- Issue date Sep 19, 2017
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radically curable compound, method for producing radically curable...
- Patent number 9,550,723
- Issue date Jan 24, 2017
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Phenolic hydroxyl group-containing compound, phenolic hydroxyl grou...
- Patent number 9,481,631
- Issue date Nov 1, 2016
- DIC Corporation
- Dongmi Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radically curable compound, method for producing radically curable...
- Patent number 9,469,592
- Issue date Oct 18, 2016
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyether ester composition, polyurethane resin composition, and op...
- Patent number 8,946,374
- Issue date Feb 3, 2015
- DIC Corporation
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition, coating film thereof, and novolac...
- Patent number 8,846,297
- Issue date Sep 30, 2014
- DIC Corporation
- Tomoyuki Imada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Radically curable compound, cured product thereof, and method for p...
- Patent number 8,816,033
- Issue date Aug 26, 2014
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-type photoresist composition
- Patent number 8,623,585
- Issue date Jan 7, 2014
- DIC Corporation
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Epoxy resin composition, process for producing epoxy resin, novel e...
- Patent number 7,569,654
- Issue date Aug 4, 2009
- DIC Corporation
- Ichiro Ogura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Phenolic resin formed from a difunctional phenol and a divinyl ether
- Patent number 7,456,247
- Issue date Nov 25, 2008
- Dainippon Ink and Chemicals, Inc.
- Ichiro Ogura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Epoxy resin composition, process for producing epoxy resin, novel e...
- Patent number 7,365,147
- Issue date Apr 29, 2008
- Dainippon Ink and Chemicals, Inc.
- Ichiro Ogura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Epoxy resin composition, process for producing epoxy resin, novel e...
- Patent number 7,087,702
- Issue date Aug 8, 2006
- Dainippon Ink and Chemicals, Inc.
- Ichiro Ogura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Epoxy resin composition, cured article thereof, novel epoxy resin,...
- Patent number 6,784,228
- Issue date Aug 31, 2004
- Dainippon Ink and Chemicals, Inc.
- Ichiro Ogura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF SEARCHING FOR THERMOSETTING EPOXY RESIN COMPOSITION, INFO...
- Publication number 20250037804
- Publication date Jan 30, 2025
- DIC CORPORATION
- Yutaro NISHIYAMA
Information Patent Application
METHOD OF SEARCHING FOR THERMOSETTING EPOXY RESIN COMPOSITION, INFO...
- Publication number 20250022546
- Publication date Jan 16, 2025
- DIC CORPORATION
- Yutaro NISHIYAMA
Information Patent Application
PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKA...
- Publication number 20240270891
- Publication date Aug 15, 2024
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR SEARCHING FOR NOVOLAC PHENOL RESIN, INFORMATION PROCESSI...
- Publication number 20240086733
- Publication date Mar 14, 2024
- DIC CORPORATION
- Tomoyuki IMADA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COATING COMPOSITION FOR PRODUCING INTERLAYER INSULATION FILM, INTER...
- Publication number 20230159707
- Publication date May 25, 2023
- DIC CORPORATION
- Takeshi Ibe
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
CALIXARENE COMPOUND, CURABLE COMPOSITION AND CURED PRODUCT
- Publication number 20220315527
- Publication date Oct 6, 2022
- DIC CORPORATION
- Shinya Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CALIXARENE COMPOUND, CURABLE COMPOSITION, AND CURED PRODUCT
- Publication number 20210198178
- Publication date Jul 1, 2021
- DIC CORPORATION
- Shinya Yamamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST MATERIAL
- Publication number 20200166838
- Publication date May 28, 2020
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CALIXARENE COMPOUND AND CURABLE COMPOSITION
- Publication number 20190276421
- Publication date Sep 12, 2019
- DIC CORPORATION
- Shinya Yamamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVOLAK RESINS AND RESIST MATERIALS
- Publication number 20190169348
- Publication date Jun 6, 2019
- DIC CORPORATION
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM
- Publication number 20190077901
- Publication date Mar 14, 2019
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVOLAC RESIN AND RESIST FILM
- Publication number 20180346635
- Publication date Dec 6, 2018
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVOLAC RESIN AND RESIST FILM
- Publication number 20180334523
- Publication date Nov 22, 2018
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN CONTAINING PHENOLIC HYDROXYL GROUPS, AND RESIST FILM
- Publication number 20180327533
- Publication date Nov 15, 2018
- DIC CORPORATION
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM
- Publication number 20180134834
- Publication date May 17, 2018
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CURABLE COMPOSITION FOR PERMANENT RESIST FILMS, AND PERMANENT RESIS...
- Publication number 20170349690
- Publication date Dec 7, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHENOLIC HYDROXYL-CONTAINING COMPOUND, COMPOSITION CONTAINING THE S...
- Publication number 20170334817
- Publication date Nov 23, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NAPHTHOL-TYPE CALIXARENE COMPOUND AND METHOD FOR PRODUCING THE SAME...
- Publication number 20170329226
- Publication date Nov 16, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND...
- Publication number 20170329221
- Publication date Nov 16, 2017
- DIC CORPORATION
- Tomoyuki IMADA
- G01 - MEASURING TESTING
Information Patent Application
NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENS...
- Publication number 20170260315
- Publication date Sep 14, 2017
- DIC CORPORATION
- Tomoyuki IMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHENOLIC HYDROXYL GROUP-CONTAINING RESIN, PRODUCTION METHOD THEREFO...
- Publication number 20170137556
- Publication date May 18, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NOVOLAC-TYPE PHENOLIC HYDROXYL GROUP-CONTANING RESIN, PRODUCTION ME...
- Publication number 20170121444
- Publication date May 4, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND...
- Publication number 20170082923
- Publication date Mar 23, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRO...
- Publication number 20170066703
- Publication date Mar 9, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADICALLY CURABLE COMPOUND, METHOD FOR PRODUCING RADICALLY CURABLE...
- Publication number 20160376218
- Publication date Dec 29, 2016
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR M...
- Publication number 20160177020
- Publication date Jun 23, 2016
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND CONTAINING PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSIT...
- Publication number 20160159962
- Publication date Jun 9, 2016
- DIC CORPORATION
- Tomoyuki Imada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MODIFIED NOVOLAC PHENOL RESIN, RESIST MATERIAL, COATING FILM, AND R...
- Publication number 20160017083
- Publication date Jan 21, 2016
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHENOLIC HYDROXYL GROUP-CONTANING COMPOUND, PHENOLIC HYDROXYL GROUP...
- Publication number 20150274636
- Publication date Oct 1, 2015
- DIC CORPORATION
- Dongmi Shin
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADICALLY CURABLE COMPOUND, METHOD FOR PRODUCING RADICALLY CURABLE...
- Publication number 20150166459
- Publication date Jun 18, 2015
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY

Tomoyuki Imada

Person

Patents Grantslast 30 patents

Resist material

Calixarene compound, curable composition, and cured product

Novolak resins and resist materials

Calixarene compound and curable composition

Phenolic-hydroxyl-group-containing novolac resin and resist film

Naphthol-type calixarene compound and method for producing the same...

Resin containing phenolic hydroxyl groups, and resist film

Phenolic hydroxyl-containing compound, composition containing the s...

Curable composition for permanent resist films, and permanent resis...

Novolac phenol resin, manufacturing method therefor, photosensitive...

Novolac-type phenolic hydroxyl group-containing resin, production m...

Compound containing modified phenolic hydroxy group, method for pro...

Phenolic hydroxyl group-containing resin, production method therefo...

Compound containing phenolic hydroxy group, photosensitive composit...

Modified hydroxy naphthalene novolak resin, production method for m...

Radically curable compound, method for producing radically curable...

Phenolic hydroxyl group-containing compound, phenolic hydroxyl grou...

Radically curable compound, method for producing radically curable...

Polyether ester composition, polyurethane resin composition, and op...

Positive photoresist composition, coating film thereof, and novolac...

Radically curable compound, cured product thereof, and method for p...

Positive-type photoresist composition

Epoxy resin composition, process for producing epoxy resin, novel e...

Phenolic resin formed from a difunctional phenol and a divinyl ether

Epoxy resin composition, process for producing epoxy resin, novel e...

Epoxy resin composition, process for producing epoxy resin, novel e...

Epoxy resin composition, cured article thereof, novel epoxy resin,...

Patents Applicationslast 30 patents

METHOD OF SEARCHING FOR THERMOSETTING EPOXY RESIN COMPOSITION, INFO...

METHOD OF SEARCHING FOR THERMOSETTING EPOXY RESIN COMPOSITION, INFO...

PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKA...

METHOD FOR SEARCHING FOR NOVOLAC PHENOL RESIN, INFORMATION PROCESSI...

COATING COMPOSITION FOR PRODUCING INTERLAYER INSULATION FILM, INTER...

CALIXARENE COMPOUND, CURABLE COMPOSITION AND CURED PRODUCT

CALIXARENE COMPOUND, CURABLE COMPOSITION, AND CURED PRODUCT

RESIST MATERIAL

CALIXARENE COMPOUND AND CURABLE COMPOSITION

NOVOLAK RESINS AND RESIST MATERIALS

NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM

NOVOLAC RESIN AND RESIST FILM

NOVOLAC RESIN AND RESIST FILM

RESIN CONTAINING PHENOLIC HYDROXYL GROUPS, AND RESIST FILM

PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM

CURABLE COMPOSITION FOR PERMANENT RESIST FILMS, AND PERMANENT RESIS...

PHENOLIC HYDROXYL-CONTAINING COMPOUND, COMPOSITION CONTAINING THE S...

NAPHTHOL-TYPE CALIXARENE COMPOUND AND METHOD FOR PRODUCING THE SAME...

PHOTOSENSITIVE COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND...

NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENS...

PHENOLIC HYDROXYL GROUP-CONTAINING RESIN, PRODUCTION METHOD THEREFO...

NOVOLAC-TYPE PHENOLIC HYDROXYL GROUP-CONTANING RESIN, PRODUCTION ME...

PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND...

COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRO...

RADICALLY CURABLE COMPOUND, METHOD FOR PRODUCING RADICALLY CURABLE...

MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR M...

COMPOUND CONTAINING PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSIT...

MODIFIED NOVOLAC PHENOL RESIN, RESIST MATERIAL, COATING FILM, AND R...

PHENOLIC HYDROXYL GROUP-CONTANING COMPOUND, PHENOLIC HYDROXYL GROUP...

RADICALLY CURABLE COMPOUND, METHOD FOR PRODUCING RADICALLY CURABLE...