Tomoyuki Matsumoto

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing plated shaped structure and photosensitive res...
- Patent number 11,249,398
- Issue date Feb 15, 2022
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20240219832
- Publication date Jul 4, 2024
- JSR Corporation
- Tomoyuki MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20230036031
- Publication date Feb 2, 2023
- JSR Corporation
- Naoki NISHIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20220057714
- Publication date Feb 24, 2022
- JSR Corporation
- Naoki NISHIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING PLATED FORMED PRODUCT
- Publication number 20220035246
- Publication date Feb 3, 2022
- JSR Corporation
- Naoki NISHIGUCHI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20220026802
- Publication date Jan 27, 2022
- JSR Corporation
- Yuka SANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20210325783
- Publication date Oct 21, 2021
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20210311391
- Publication date Oct 7, 2021
- JSR Corporation
- Takuhiro TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING PLATED SHAPED STRUCTURE AND PHOTOSENSITIVE RES...
- Publication number 20190391489
- Publication date Dec 26, 2019
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tomoyuki Matsumoto

Person

Patents Grantslast 30 patents

Photosensitive resin composition, method for producing resist patte...

Photosensitive resin composition, method for forming resist pattern...

Method for producing plated shaped structure and photosensitive res...

Patents Applicationslast 30 patents

PHOTOSENSITIVE COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

METHOD FOR PRODUCING PLATED FORMED PRODUCT

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

METHOD FOR PRODUCING PLATED SHAPED STRUCTURE AND PHOTOSENSITIVE RES...