Tomoyuki NAGATA

Person

Oshu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Injector and substrate processing apparatus using the same, and sub...
- Patent number 11,846,023
- Issue date Dec 19, 2023
- Tokyo Electron Limited
- Tomoyuki Nagata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate loading method, and subst...
- Patent number 10,934,618
- Issue date Mar 2, 2021
- Tokyo Electron Limited
- Tomoyuki Nagata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,636,627
- Issue date Apr 28, 2020
- Tokyo Electron Limited
- Hirofumi Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer boat support table and heat treatment apparatus using the same
- Patent number 10,014,199
- Issue date Jul 3, 2018
- Tokyo Electron Limited
- Tomoyuki Nagata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming silicon film
- Patent number 9,293,323
- Issue date Mar 22, 2016
- Tokyo Electron Limited
- Tomoyuki Obu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming seed layer, method of forming silicon film, and f...
- Patent number 9,263,256
- Issue date Feb 16, 2016
- Tokyo Electron Limited
- Tomoyuki Obu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ABNORMALITY DETECTION METHOD AND PROCESSING APPARATUS
- Publication number 20220270940
- Publication date Aug 25, 2022
- TOKYO ELECTRON LIMITED
- Shingo HISHIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE LOADING METHOD, AND SUBST...
- Publication number 20200115796
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Tomoyuki NAGATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INJECTOR AND SUBSTRATE PROCESSING APPARTATUS USING THE SAME, AND SU...
- Publication number 20200102652
- Publication date Apr 2, 2020
- TOKYO ELECTRON LIMITED
- Tomoyuki NAGATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER BOAT SUPPORT TABLE AND HEAT TREATMENT APPARATUS USING THE SAME
- Publication number 20170140964
- Publication date May 18, 2017
- TOKYO ELECTRON LIMITED
- Tomoyuki NAGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20160276206
- Publication date Sep 22, 2016
- TOKYO ELECTRON LIMITED
- Hirofumi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SILICON FILM AND FILM FORMING APPARATUS
- Publication number 20140187025
- Publication date Jul 3, 2014
- TOKYO ELECTRON LIMITED
- Tomoyuki OBU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SEED LAYER, METHOD OF FORMING SILICON FILM, AND F...
- Publication number 20140187024
- Publication date Jul 3, 2014
- TOKYO ELECTRON LIMITED
- Tomoyuki OBU
- C30 - CRYSTAL GROWTH

Tomoyuki NAGATA

Person

Patents Grantslast 30 patents

Injector and substrate processing apparatus using the same, and sub...

Substrate processing apparatus, substrate loading method, and subst...

Substrate processing apparatus

Wafer boat support table and heat treatment apparatus using the same

Method of forming silicon film

Method of forming seed layer, method of forming silicon film, and f...

Patents Applicationslast 30 patents

ABNORMALITY DETECTION METHOD AND PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE LOADING METHOD, AND SUBST...

INJECTOR AND SUBSTRATE PROCESSING APPARTATUS USING THE SAME, AND SU...

WAFER BOAT SUPPORT TABLE AND HEAT TREATMENT APPARATUS USING THE SAME

Substrate Processing Apparatus

METHOD OF FORMING SILICON FILM AND FILM FORMING APPARATUS

METHOD OF FORMING SEED LAYER, METHOD OF FORMING SILICON FILM, AND F...