Tomoyuki TAMURA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,112,925
- Issue date Oct 8, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method and inspection method of interior member of pl...
- Patent number 11,987,880
- Issue date May 21, 2024
- HITACHI HIGH-TECH CORPORATION
- Kazuhiro Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 11,664,233
- Issue date May 30, 2023
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,315,792
- Issue date Apr 26, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,257,661
- Issue date Feb 22, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 11,107,694
- Issue date Aug 31, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 10,490,412
- Issue date Nov 26, 2019
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,395,935
- Issue date Aug 27, 2019
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,941,133
- Issue date Apr 10, 2018
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,607,874
- Issue date Mar 28, 2017
- Hitachi High-Technologies Corporation
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,569,177
- Issue date Oct 29, 2013
- Hitachi High-Technologies Corporation
- Tomohiro Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,186,300
- Issue date May 29, 2012
- Hitachi High-Technologies Corporation
- Takamasa Ichino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing device
- Patent number 8,163,652
- Issue date Apr 24, 2012
- Hitachi High-Technologies Corporation
- Kenji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,767,054
- Issue date Aug 3, 2010
- Hitachi High-Technologies Corporation
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing device
- Patent number 7,435,687
- Issue date Oct 14, 2008
- Hitachi High-Technologies Corporation
- Kenji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, protecting layer therefor and installa...
- Patent number 7,052,731
- Issue date May 30, 2006
- Hitachi High-Technologies Corporation
- Kunihiko Koroyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 6,914,005
- Issue date Jul 5, 2005
- Hitachi High-Technologies Corporation
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,506,686
- Issue date Jan 14, 2003
- Hitachi, Ltd.
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching system
- Patent number 6,444,087
- Issue date Sep 3, 2002
- Hitachi, Ltd.
- Makoto Nawata
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240047258
- Publication date Feb 8, 2024
- Hitachi High-Tech Corporation
- Tomoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER
- Publication number 20230207279
- Publication date Jun 29, 2023
- HITACHI HIGH-TECH CORPORATION
- Kazuhiro UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD AND INSPECTION METHOD OF INTERIOR MEMBER OF PL...
- Publication number 20230101039
- Publication date Mar 30, 2023
- Hitachi High-Tech Corporation
- Kazuhiro Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220139678
- Publication date May 5, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20210358758
- Publication date Nov 18, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND INNER COMPONENT OF PLASMA PROCESSIN...
- Publication number 20210241998
- Publication date Aug 5, 2021
- Hitachi High-Technologies Corporation
- Tomoyuki TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20200058511
- Publication date Feb 20, 2020
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190333772
- Publication date Oct 31, 2019
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER
- Publication number 20190326101
- Publication date Oct 24, 2019
- Hitachi High-Technologies Corporation
- Kazuhiro UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180190502
- Publication date Jul 5, 2018
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20170194157
- Publication date Jul 6, 2017
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160336185
- Publication date Nov 17, 2016
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160079043
- Publication date Mar 17, 2016
- Hitachi High-Technologies Corporation
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160027615
- Publication date Jan 28, 2016
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130189800
- Publication date Jul 25, 2013
- Tomohiro OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20100326957
- Publication date Dec 30, 2010
- Kenji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100319854
- Publication date Dec 23, 2010
- Kenetsu YOKOGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100163184
- Publication date Jul 1, 2010
- Hitachi High-Technologies Corporation
- Takamasa ICHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD FOR PLASMA PROCESSIN...
- Publication number 20090283502
- Publication date Nov 19, 2009
- Hitachi High-Technologies Corporation
- Shinji OBAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20090004871
- Publication date Jan 1, 2009
- Kenji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing device
- Publication number 20070056928
- Publication date Mar 15, 2007
- Kenji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and particle removal method
- Publication number 20070020941
- Publication date Jan 25, 2007
- Tomoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20060254717
- Publication date Nov 16, 2006
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor manufacturing apparatus capable of preventing adhesio...
- Publication number 20060169207
- Publication date Aug 3, 2006
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method
- Publication number 20050126712
- Publication date Jun 16, 2005
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus, protecting layer therefor and installa...
- Publication number 20050045107
- Publication date Mar 3, 2005
- Kunihiko Koroyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20040050495
- Publication date Mar 18, 2004
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma etching method
- Publication number 20030166343
- Publication date Sep 4, 2003
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, protecting layer therefor and installa...
- Publication number 20030159778
- Publication date Aug 28, 2003
- Kunihiko Koroyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of plasma etching
- Publication number 20020011464
- Publication date Jan 31, 2002
- Makoto Nawata
- H01 - BASIC ELECTRIC ELEMENTS

Tomoyuki TAMURA

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Manufacturing method and inspection method of interior member of pl...

Method for releasing sample and plasma processing apparatus using same

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Method for releasing sample and plasma processing apparatus using same

Method for releasing sample and plasma processing apparatus using same

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing method and plasma processing device

Plasma processing apparatus

Plasma processing method and plasma processing device

Plasma processing apparatus, protecting layer therefor and installa...

Plasma etching method

Plasma processing apparatus and plasma processing method

Plasma etching system

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER

MANUFACTURING METHOD AND INSPECTION METHOD OF INTERIOR MEMBER OF PL...

PLASMA PROCESSING APPARATUS

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS AND INNER COMPONENT OF PLASMA PROCESSIN...

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND CONTROL METHOD FOR PLASMA PROCESSIN...

PROCESSING METHOD AND PLASMA PROCESSING DEVICE

Plasma processing method and plasma processing device

Plasma etching apparatus and particle removal method

Plasma processing apparatus

Semiconductor manufacturing apparatus capable of preventing adhesio...

Plasma processing method

Plasma processing apparatus, protecting layer therefor and installa...

Plasma processing apparatus and plasma processing method

Plasma etching method

Plasma processing apparatus, protecting layer therefor and installa...

Method of plasma etching