Tomoyuki WATANABE

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Kudamatsu, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and sample stage
- Patent number 9,150,967
- Issue date Oct 6, 2015
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 8,889,024
- Issue date Nov 18, 2014
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,741,166
- Issue date Jun 3, 2014
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,580,131
- Issue date Nov 12, 2013
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Etching Method
- Publication number 20140220785
- Publication date Aug 7, 2014
- Hitachi High-Technologies Corporation
- Tomoyuki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20130157470
- Publication date Jun 20, 2013
- Hitachi High-Technologies Corporation
- Tomoyuki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20130109184
- Publication date May 2, 2013
- Hitachi High-Technologies Corporation
- Tomoyuki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SAMPLE STAGE
- Publication number 20110297082
- Publication date Dec 8, 2011
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...