Tong Lei

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Fabrication technology for metal gate
- Patent number 10,276,450
- Issue date Apr 30, 2019
- Shanghai Huali Microelectronics Corporation
- Tong Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration process of finFET spacer formation
- Patent number 10,038,078
- Issue date Jul 31, 2018
- Shanghai Huali Microelectronics Corporation
- Hailan Yi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of planarizing polysilicon gate
- Patent number 9,570,562
- Issue date Feb 14, 2017
- Shanghai Huali Microelectronics Corporation
- Tong Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming cobalt barrier layer and metal interconnection p...
- Patent number 9,449,872
- Issue date Sep 20, 2016
- Shanghai Huali Microelectronics Corporation
- Tong Lei
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
WAFER BOW COMPENSATION BY PATTERNED UV CURE
- Publication number 20250166991
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Tong LEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION TECHNOLOGY FOR METAL GATE
- Publication number 20180174924
- Publication date Jun 21, 2018
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Tong Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATION PROCESS OF FINFET SPACER FORMATION
- Publication number 20180175169
- Publication date Jun 21, 2018
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Hailan Yi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING COBALT BARRIER LAYER AND METAL INTERCONNECTION P...
- Publication number 20160300758
- Publication date Oct 13, 2016
- Shanghai Huali Microelectronics Corporation
- Tong Lei
- H01 - BASIC ELECTRIC ELEMENTS