Tony DiBiase

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Assessing critical dimension and overlay tolerance
- Patent number 8,121,396
- Issue date Feb 21, 2012
- KLA-Tencor Corporation
- Tony DiBiase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process condition measuring device
- Patent number 8,104,342
- Issue date Jan 31, 2012
- KLA-Tencor Corporation
- Mei H. Sun
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Intelligent stitching boundary defect inspection
- Patent number 7,987,057
- Issue date Jul 26, 2011
- KLA-Tencor Corporation
- Tony DiBiase
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Temperature effects on overlay accuracy
- Patent number 7,924,408
- Issue date Apr 12, 2011
- KLA-Tencor Technologies Corporation
- Tony DiBiase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Registration target design for managing both reticle grid error and...
- Patent number 7,408,642
- Issue date Aug 5, 2008
- KLA-Tencor Technologies Corporation
- Tony DiBiase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for locating, displaying, analyzing, and optionally monitor...
- Patent number 7,202,094
- Issue date Apr 10, 2007
- KLA-Tencor Technologies Corporation
- Tony DiBiase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for locating, displaying, analyzing, and optionally monitor...
- Patent number 6,977,183
- Issue date Dec 20, 2005
- KLA-Tencor Technologies Corporation
- Tony DiBiase
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS CONDITION MEASURING DEVICE
- Publication number 20130029433
- Publication date Jan 31, 2013
- KLA-Tencor Corporation
- Mei H. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONDITION MEASURING DEVICE
- Publication number 20090056441
- Publication date Mar 5, 2009
- KLA-Tencor Corporation
- Mei H. Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Temperature effects on overlay accuracy
- Publication number 20080204678
- Publication date Aug 28, 2008
- KLA-Tencor Technologies Corporation
- Tony DiBiase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for locating, displaying, analyzing, and optionally monitor...
- Publication number 20060030061
- Publication date Feb 9, 2006
- Tony DiBiase
- H01 - BASIC ELECTRIC ELEMENTS

Tony DiBiase

Person

Patents Grantslast 30 patents

Assessing critical dimension and overlay tolerance

Process condition measuring device

Intelligent stitching boundary defect inspection

Temperature effects on overlay accuracy

Registration target design for managing both reticle grid error and...

Process for locating, displaying, analyzing, and optionally monitor...

Process for locating, displaying, analyzing, and optionally monitor...

Patents Applicationslast 30 patents

PROCESS CONDITION MEASURING DEVICE

PROCESS CONDITION MEASURING DEVICE

Temperature effects on overlay accuracy

Process for locating, displaying, analyzing, and optionally monitor...