Tony F. Heinz

Person

Chappaqua, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
In-situ monitoring and control of conductive films by detecting cha...
- Patent number 6,072,313
- Issue date Jun 6, 2000
- International Business Machines Corporation
- Leping Li
- G01 - MEASURING TESTING
Information Patent Grant
Real time measurement of etch rate during a chemical etching process
- Patent number 5,788,801
- Issue date Aug 4, 1998
- International Business Machines Corporation
- Steven George Barbee
- B24 - GRINDING POLISHING
Information Patent Grant
In-situ monitoring of the change in thickness of films
- Patent number 5,731,697
- Issue date Mar 24, 1998
- International Business Machines Corporation
- Leping Li
- G01 - MEASURING TESTING
Information Patent Grant
In-situ monitoring of conductive films on semiconductor wafers
- Patent number 5,660,672
- Issue date Aug 26, 1997
- International Business Machines Corporation
- Leping Li
- G01 - MEASURING TESTING
Information Patent Grant
Real time measurement of etch rate during a chemical etching process
- Patent number 5,582,746
- Issue date Dec 10, 1996
- International Business Machines Corporation
- Steven G. Barbee
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical etch monitor for measuring film etching uniformity during...
- Patent number 5,573,624
- Issue date Nov 12, 1996
- International Business Machines Corporation
- Steven G. Barbee
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for contactless real-time in-situ monitoring of a chemica...
- Patent number 5,573,623
- Issue date Nov 12, 1996
- International Business Machines Corporation
- Steven G. Barbee
- B24 - GRINDING POLISHING
Information Patent Grant
In-situ monitoring of the change in thickness of films
- Patent number 5,559,428
- Issue date Sep 24, 1996
- International Business Machines Corporation
- Leping Li
- G01 - MEASURING TESTING
Information Patent Grant
Contactless real-time in-situ monitoring of a chemical etching
- Patent number 5,516,399
- Issue date May 14, 1996
- International Business Machines Corporation
- Michael J. Balconi-Lamica
- B24 - GRINDING POLISHING
Information Patent Grant
Minimizing overetch during a chemical etching process
- Patent number 5,501,766
- Issue date Mar 26, 1996
- International Business Machines Corporation
- Steven G. Barbee
- G01 - MEASURING TESTING
Information Patent Grant
Real time measurement of etch rate during a chemical etching process
- Patent number 5,500,073
- Issue date Mar 19, 1996
- International Business Machines Corporation
- Steven G. Barbee
- B24 - GRINDING POLISHING
Information Patent Grant
Measuring film etching uniformity during a chemical etching process
- Patent number 5,489,361
- Issue date Feb 6, 1996
- International Business Machines Corporation
- Steven G. Barbee
- B24 - GRINDING POLISHING
Information Patent Grant
Method for contactless real-time in-situ monitoring of a chemical e...
- Patent number 5,480,511
- Issue date Jan 2, 1996
- International Business Machines Corporation
- Steven G. Barbee
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for contactless real-time in-situ monitoring o...
- Patent number 5,456,788
- Issue date Oct 10, 1995
- International Business Machines Corporation
- Steven G. Barbee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fixture for in-situ noncontact monitoring of wet chemical etching w...
- Patent number 5,451,289
- Issue date Sep 19, 1995
- International Business Machines Corporation
- Steven G. Barbee
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for contactless real-time in-situ monitoring o...
- Patent number 5,445,705
- Issue date Aug 29, 1995
- International Business Machines Corporation
- Steven G. Barbee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for real-time, in-situ endpoint detection and...
- Patent number 5,392,124
- Issue date Feb 21, 1995
- International Business Machines Corporation
- Steven G. Barbee
- G01 - MEASURING TESTING
Information Patent Grant
In situ, non-destructive CVD surface monitor
- Patent number 5,386,121
- Issue date Jan 31, 1995
- International Business Machines Corporation
- Steven G. Barbee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for real-time film surface detection for large...
- Patent number 5,381,234
- Issue date Jan 10, 1995
- International Business Machines Corporation
- Steven G. Barbee
- G01 - MEASURING TESTING
Information Patent Grant
Contactless real-time in-situ monitoring of a chemical etching process
- Patent number 5,338,390
- Issue date Aug 16, 1994
- International Business Machines Corporation
- Steven G. Barbee
- B24 - GRINDING POLISHING
Information Patent Grant
Detection of interfaces with atomic resolution during material proc...
- Patent number 5,294,289
- Issue date Mar 15, 1994
- International Business Machines Corporation
- Tony F. Heinz
- B24 - GRINDING POLISHING

Tony F. Heinz

Person

Patents Grantslast 30 patents

In-situ monitoring and control of conductive films by detecting cha...

Real time measurement of etch rate during a chemical etching process

In-situ monitoring of the change in thickness of films

In-situ monitoring of conductive films on semiconductor wafers

Real time measurement of etch rate during a chemical etching process

Chemical etch monitor for measuring film etching uniformity during...

Apparatus for contactless real-time in-situ monitoring of a chemica...

In-situ monitoring of the change in thickness of films

Contactless real-time in-situ monitoring of a chemical etching

Minimizing overetch during a chemical etching process

Real time measurement of etch rate during a chemical etching process

Measuring film etching uniformity during a chemical etching process

Method for contactless real-time in-situ monitoring of a chemical e...

Method and apparatus for contactless real-time in-situ monitoring o...

Fixture for in-situ noncontact monitoring of wet chemical etching w...

Method and apparatus for contactless real-time in-situ monitoring o...

Method and apparatus for real-time, in-situ endpoint detection and...

In situ, non-destructive CVD surface monitor

Method and apparatus for real-time film surface detection for large...

Contactless real-time in-situ monitoring of a chemical etching process

Detection of interfaces with atomic resolution during material proc...