Tony Quan Tran

Person

Bear, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Neutral to alkaline chemical mechanical polishing compositions and...
- Patent number 11,591,495
- Issue date Feb 28, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Neutral to alkaline chemical mechanical polishing compositions and...
- Patent number 10,995,238
- Issue date May 4, 2021
- Rohm and Haas Electronic Materials CMP Holdings
- Yi Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-rate CMP polishing method
- Patent number 10,857,647
- Issue date Dec 8, 2020
- Rohm and Haas Electronic Materials CMP Holdings
- John Vu Nguyen
- B24 - GRINDING POLISHING
Information Patent Grant
Trapezoidal CMP groove pattern
- Patent number 10,857,648
- Issue date Dec 8, 2020
- Rohm and Haas Electronic Materials CMP Holdings
- John Vu Nguyen
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled residence CMP polishing method
- Patent number 10,861,702
- Issue date Dec 8, 2020
- Rohm and Haas Electronic Materials CMP Holdings
- John Vu Nguyen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Biased pulse CMP groove pattern
- Patent number 10,777,418
- Issue date Sep 15, 2020
- Rohm and Haas Electronic Materials CMP Holdings, I
- John Vu Nguyen
- B24 - GRINDING POLISHING
Information Patent Grant
Uniform CMP polishing method
- Patent number 10,586,708
- Issue date Mar 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John Vu Nguyen
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making composite polishing layer for chemical mechanical...
- Patent number 10,092,998
- Issue date Oct 9, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making composite polishing layer for chemical mechanical...
- Patent number 10,011,002
- Issue date Jul 3, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,776,300
- Issue date Oct 3, 2017
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad composite polishing layer formula...
- Patent number 9,630,293
- Issue date Apr 25, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,586,305
- Issue date Mar 7, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
NEUTRAL TO ALKALINE CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND...
- Publication number 20210163787
- Publication date Jun 3, 2021
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIASED PULSE CMP GROOVE PATTERN
- Publication number 20200381258
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- B24 - GRINDING POLISHING
Information Patent Application
NEUTRAL TO ALKALINE CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND...
- Publication number 20200010726
- Publication date Jan 9, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BIASED PULSE CMP GROOVE PATTERN
- Publication number 20180366333
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-RATE CMP POLISHING METHOD
- Publication number 20180361532
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRAPEZOIDAL CMP GROOVE PATTERN
- Publication number 20180361533
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM CMP POLISHING METHOD
- Publication number 20180366331
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLED RESIDENCE CMP POLISHING METHOD
- Publication number 20180366332
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160379840
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160375543
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- G02 - OPTICS
Information Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
- Publication number 20160375552
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD COMPOSITE POLISHING LAYER FORMULA...
- Publication number 20160375545
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
- Publication number 20160375554
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING

Tony Quan Tran

Person

Patents Grantslast 30 patents

Neutral to alkaline chemical mechanical polishing compositions and...

Neutral to alkaline chemical mechanical polishing compositions and...

High-rate CMP polishing method

Trapezoidal CMP groove pattern

Controlled residence CMP polishing method

Biased pulse CMP groove pattern

Uniform CMP polishing method

Method of making composite polishing layer for chemical mechanical...

Method of making composite polishing layer for chemical mechanical...

Chemical mechanical polishing pad and method of making same

Chemical mechanical polishing pad composite polishing layer formula...

Chemical mechanical polishing pad and method of making same

Patents Applicationslast 30 patents

NEUTRAL TO ALKALINE CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND...

BIASED PULSE CMP GROOVE PATTERN

NEUTRAL TO ALKALINE CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND...

BIASED PULSE CMP GROOVE PATTERN

HIGH-RATE CMP POLISHING METHOD

TRAPEZOIDAL CMP GROOVE PATTERN

UNIFORM CMP POLISHING METHOD

CONTROLLED RESIDENCE CMP POLISHING METHOD

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...

CHEMICAL MECHANICAL POLISHING PAD COMPOSITE POLISHING LAYER FORMULA...

METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...